Paper 13216-38
Paper 13216-38
Recent advancement and future plans on electron multi-beam mask writers (Invited Paper)
1 October 2024 • 3:55 PM - 4:15 PM PDT | Monterey Conf. Ctr., Steinbeck 2
Abstract
The multi-beam mask writer MBM-3000 has been launched since 2023 for next generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode that brings out a current density of 3.6 A/cm2, in order to achieve better resolution and writing speed than our current writer MBM-2000PLUS. New optics with a next-generation blanking aperture array (BAA) is installed to have a 2X beam count. A data generation system has a 2X speed so that it can handle layouts of next-generation EUV masks without a data processing overhead. In this paper, we will introduce improved writing performances of the MBM-3000, and also discuss our future plans towards the angstrom era.
Presenter
Jumpei Yasuda
NuFlare Technology, Inc. (Japan)
In 2017, Jumpei Yasuda received his Ph.D. in physics from Kyushu University, Japan.
In the same year, he joined Nuflare Technology Inc.
After joining the company, he worked on the installation of EBM9000 series, and then engaged in the development of EBM and MBM series.
He is mainly responsible for writing accuracy evaluation, system design development, and is currently the technical leader of MBM-3000.