Advanced Lithography + Patterning

The 2022 call for papers is open: Share your research, challenges, and breakthroughs with colleagues in San Jose

The conference for emerging technology in the semiconductor industry

Submit your abstract and join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

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Present your research at Advanced Lithography + Patterning 2022 in San Jose

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Prepare your abstract

Review everything you need to know about presenting at SPIE Advanced Lithography + Patterning in 2022. With the call for papers open, abstracts are due 1 September 2021.

Presenter at SPIE Advanced Lithography + Patterning

Researchers in the following topics are encouraged to participate

Extreme ultraviolet (EUV) lithography
Novel patterning technologies for semiconductors, MEMS/NEMS and MOEMS
Metrology, inspection, and process control for microlithography

Advances in patterning materials and processes
Optical microlithography
Design-process-technology co-optimization for manufacturability
Advanced etch technology for nanopatterning

Take a closer look

Learn about the technical conferences

Review the six topic areas to see where your research fits best. We welcome your participation.

An image of CPU die: technology advanced at SPIE Advanced Lithography + Patterning

Exhibit at Advanced Lithography + Patterning

Connect with the semiconductor community

The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and to get business done.

Find past proceedings in the SPIE Digital Library

Access the 2021 research and recordings

SPIE Advanced Lithography 2021 conference proceedings papers and presentation recordings are published in the SPIE Digital Library as they become available. All 2021 paid conference registrations included one volume for ongoing access.

Person browses SPIE Proceedings in SPIE Digital Library