All the great content from SPIE Advanced Lithography + Patterning, now extended

From 23–29 May 2022, all attendees with a paid technical registration to SPIE Advanced Lithography + Patterning in San Jose will be able to view the presentation recordings, posters and poster preview videos, including recorded plenary and keynote presentations and newly added research from presenters unable to travel.

Access research from the only cross-disciplinary event highlighting the optics and photonics technologies enabling semiconductor manufacturing and its adjacent applications.

If you were not able to travel, you now have an opportunity to register and explore all of the amazing research from Advanced Lithography + Patterning 2022 on your own schedule.
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See San Jose highlights

View highlights, news articles, and photos from the in-person evevt in San Jose. We hope to see you there in 2023. 

View highlights

A week's worth of content

  • Plenary talks
  • Technical presentations
  • Poster presentations

Joining the On Demand week - here's how

Follow these How to Participate instructions to access great content - whether already registered, or needing to. 

2022 Plenary presentations: come to hear from experts

Luc Van den Hove, President & CEO, imec (Belgium) -- a plenary speaker at the 2022 event

Luc Van den Hove

President & CEO, imec (Belgium), presents: The power of deeptech: a tale of bits, molecules and ecosystems

H.S. Philip Wong, Department of Electrical Engineering, Standford (USA) -- a plenary speaker at the 2022 event

H.S. Philip Wong

Department of Electrical Engineering, Standford (USA), presents: Does lithography still matter after high NA EUV?

H.S. Philip Wong, Department of Electrical Engineering, Standford (USA) -- a plenary speaker at the 2022 event

Erik Hosler

Process Exploration for Photonics, PsiQuantum (USA), presents: The path to a useful quantum computer

Explore six great conferences

  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

Proceedings will be published on the SPIE Digital Library

Paid registration includes proceedings

SPIE Advanced Lithography 2022 conference proceedings are published in the SPIE Digital Library. All 2022 paid conference registrations include 50 proceeding downloads with ongoing access through your SPIE account.

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