Thank you for a great 2021 event
All of the 2021 Digital Forum presentations were held live—including technical and keynote presentations— which offered opportunities to hear directly from presenters and engage in question and answer sessions. You can still register to access recordings. Recordings will be available for registered attendees within a few days of each session and can be accessed on these pages through October 8. Ongoing access will be via the SPIE Digital Library.
SPIE Photomask Technology + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies. We look forward to seeing everyone in Monterey next year.
The digital forum program includes special awards, sessions, and sponsorships for students. Find ways to learn about the technology, the industry, and make important connections for your future. See what happened in 2021 and check back soon for 2022 opportunities.
The SPIE Photomask Technology + EUV Lithography 2021 online event will not include a digital exhibition. The exhibition will take place in 2022.