Contribute your research and help to build another outstanding program for 2022

Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Present your research in Monterey. The call for papers is open.

#SPIEPhotomaskEUV Twitter logo Facebook logo Instagram logo Youtube logo Linkedin logo

Explore the two conferences to see where your research fits best


Photomask technology
Extreme Ultraviolet Lithography

Present your research: Abstract submissions due 4 May


Abstract submission icon Abstract submission details Abstract submission details ...
Announcement icon Presenter information Presenter information ...

View the 2021 award recipients


See who won in 2021

View the winners announced at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2021 Digital Forum. Celebrate the important work being done and further help the industry support student participation. View the 2021 winners and start planing for the 2022 award submissions.

Attention students


Student opportunities

Find ways to learn about the technology, the industry, and make important connections for your future. This event includes includes special awards, sessions, and sponsorships for students. See what happened in 2021 and check back soon for 2022 opportunities.

Don't miss the exhibition


The mask-making industry's premier event

Attend the premier exhibition for mask makers, EUVL, emerging technologies, and mask business. Connect with top suppliers showcasing the newest products, innovations, and latest technologies.