Information for authors and presenters

Information for authors, chairs, and committees: instructions, deadlines, and tips

We hope to see you in 2024

Find links to presenter instructions, important dates, and other information for a successful abstract submission and presentation at SPIE Photomask Technology + EUV Lithography.

Practicing her presention, this author prepares for her photomask technology and EUVL presentation

Benefits of presenting and publishing your work with SPIE

Here's why publishing with SPIE puts a spotlight on your work:

The event will bring you international visibility
Your research becomes a part of the world's permanent scientific record
Your work will be indexed in all relevant scientific databases*

Make sure that your research gets timely publication in the SPIE Digital Library.

*SPIE partners with relevant scientific databases to ensure visibility for your research, including Astrophysical Data System (ADS), Ei Compendex, CrossRef, Google Scholar, Inspec, Scopus, and Web of Science Conference Proceedings Citation Index.

Important dates

Abstracts due	15 May 2024
Registration opens	July 2024
Authors notified and program posts online	8 July 2024
Submission system opens for manuscripts and poster PDFs*	29 July 2023
Poster PDFs due for spie.org preview and publication	4 September 2024
Manuscripts due	11 September 2024