Find links to presenter instructions, important dates, and other information for a successful abstract submission and presentation at SPIE Photomask Technology + EUV Lithography.
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Abstracts due | 15 May 2024 |
Registration opens | July 2024 |
Authors notified and program posts online | 8 July 2024 |
Submission system opens for manuscripts and poster PDFs* | 29 July 2023 |
Poster PDFs due for spie.org preview and publication | 4 September 2024 |
Manuscripts due | 11 September 2024 |
*Contact author or speaker must register prior to uploading
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