Photomask Technology + EUV Lithography conferences

Important topics for photomask technology and EUVL
Presenter at SPIE Photomask Technology and EUV Lithography event

Technical conferences at SPIE Photomask Technology + EUV Lithography

SPIE offers the leading multidisciplinary meeting that is focused on global breakthroughs and challenges within photomask technology and EUVL. This conference is where researchers and scientists gather to share latest advances across two conferences.

Browse call for papers

Featuring two technical conferences


Photomask Technology

Photomask Technology

Addressing key topics related to photomasks.

EUV Lithography technology

Extreme Ultraviolet Lithography

Addressing the worldwide status of EUV technology and infrastructure readiness.

Photomask Technology

  • Design automation and data prep (DFM, OPC, SMO)
  • Mask write, corrections, process compensation (MPC)
  • Mask blanks, defects, and metrology (materials, process, control)
  • Mask process (resist, develop, etch, cleans)
  • Metrology (CD, placement, AFM, AIMS)
  • Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
  • Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
  • Nanoimprint lithography tools, mask, transfer, and resists
  • Deep learning mask technology applications

Extreme Ultraviolet Lithography

  • EUV readiness and insertion in manufacturing
  • EUV tools, including sources and optics
  • EUV mask metrology, inspection, and lifetime
  • EUV mask and imaging
  • EUV mask pellicles
  • EUV resist materials/process and contamination
  • EUV process control and stochastics
  • EUV patterning and process enhancement
  • EUV lithography extendibility

Photomask Technology chairs


Stephen P. Renwick

Nikon Research Corp. of America (USA)
2021 Photomask Technology Conference Chair

Bryan S. Kasprowicz

HOYA Corp. (USA)
2021 Photomask Technology Conference Co-Chair

International Conference on Extreme Ultraviolet Lithography chairs


Patrick P. Naulleau

Lawrence Berkeley National Lab. (United States)
2021 EUV Lithography Conference Chair

Paolo A. Gargini

Stanford Univ. (United States)
2021 EUV Lithography Conference Chair

Toshiro Itani

Osaka Univ. (Japan)
2021 EUV Lithography Conference Chair

Kurt G. Ronse

imec (Belgium)
2021 EUV Lithography Conference Chair