Photomask Technology + EUV Lithography awards

Honoring outstanding achievement by our researchers

Student best paper and poster awards

SPIE is happy to announce that the industry supports student participation by presenting student best paper (oral or poster) awards sponsored by Photronics, Inc. and ZEISS.

In total four awards will be granted; two by Photronics Inc. and two by ZEISS.

SPIE gold medal award

2021: Congratulations to the award winners


Awards were presented during the 2021 Photomask Technology + EUV Lithography Digital Forum held online.

2021 BACUS scholarship winner


Maryam Baker

Maryam Baker, James C. Wyant College of Optical Sciences (United States), was awarded the BACUS Scholarship. This scholarship is awarded to a student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.

 

The 2022 application for the $5,000 BACUS scholarship is due 27 May 2022. 

See 2022 scholarship details

2021 BACUS Prize


  • Masahiko Suguro, Asahi Glass Co., Ltd. (Japan)
  • Onoue Takahiro, HOYA Corp. (Japan)
  • Shoki Tsutomu, HOYA Corp. (Japan)
  • Yoshiaki Ikuta, Asahi Glass Co., Ltd. (Japan)

2021 BACUS LTA


Ken Rygler, Rygler and Associates, Inc.

BACUS Best Paper Award 2021


Place Award winner name Paper 
First place Kan Zhou, Shanghai Huali Integrated Circuit Corp., (China)
Xin Guo, Shanghai Huali Integrated Circuit Corp., (China)
Yinsheng Yu, Shanghai Huali Integrated Circuit Corp., (China)
Hongwen Zhao, Shanghai Huali Integrated Circuit Corp., (China)
Wenzhan Zhou, Shanghai Huali Integrated Circuit Corp., (China)
Yu Zhang, Shanghai Huali Integrated Circuit Corp., (China)
Ao Chen, Siemens EDA, (China)
Wenming Wu, Siemens EDA, (China)
Qijian Wan, Siemens EDA, (China)
Huaiyang Dou, Siemens EDA, (China)
Chunshan Du, Siemens EDA, (China)
Liguo Zhang, Siemens EDA, (United States)
Germain Fenger, Siemens EDA, (United States)
Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours [11855-33]
Second place Ikuya Fukasawa, HOYA Corp., (Japan)
Yohei Ikebe, HOYA Corp., (Japan)
Takeshi Aizawa, HOYA Corp., (Japan)
Tsutomu Shoki, HOYA Corp., (Japan)
Takahiro Onoue, HOYA Corp., (Japan)
EUV attenuated phase shift mask: development and characterization of mask properties [11855-50]
Third place Ingo Bork, Siemens Digital Industries Software, Inc. (United States)
Peter Buck, Siemens Digital Industries Software, Inc. (United States)
Bhardwaj Durvasula, Mentor Graphics (India) Pvt. Ltd. (India)
Vlad Liubich, Siemens Digital Industries Software, Inc. (United States)
Nageswara Rao, Mentor Graphics (India) Pvt. Ltd. (India)
Rachit Sharma, Mentor Graphics (India) Pvt. Ltd. (India)
Mary Zuo, Siemens Digital Industries Software, Inc. (United States)
Curvature based fragmentation for curvilinear mask process correction [11855-28]

Zeiss Award for Talent in the Industry 2021


The Zeiss Award was established to support students working in the fields of EUV lithography and photomasks.

Place Award winner name Paper 
First place:
$1,000
Luke T. Long, Univ. of California Berkeley (United States)
Adam Lyons, ASML Silicon Valley (United States)
Tom Wallow, ASML (United States)
Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations [11855-2]
Second place:
$500
Argho Das, imec (Belgium)
Victor Blanco, imec (Belgium)
Sayantan Das, imec (Belgium)
Nicola Kissoon, ASML Technology Development Ctr. (Belgium)
Sandip Halder, imec (Belgium)
Mircea Dusa, imec (Belgium)
iN5 EUV single expose patterning evaluation for via layers [11854-23]

 

Award sponsor:

ZEISS

Photronics Student Award 2021


Established to encourage students working in fields related to photomasks. Four finalists were selected from mask related student oral papers.

Place Award winner name Paper 
First place
$1,000
Hazem M. S. Mesilhy, Fraunhofer IISB (Germany)
Peter Evanschitzky, Fraunhofer IISB (Germany)
Gerardo Bottiglieri, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Claire van Lare, ASML Netherlands B.V. (Netherlands)
Tim Brunner, ASML Netherlands B.V. (Netherlands)
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Andreas Erdmann, Fraunhofer IISB (Germany)
Pathfinding the perfect EUV mask: understanding the EUV mask using the hybrid mask model [11854-41]
Second place
$500
Ravij N. Sejpal, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)
EMA modelled alternative EUV absorber materials considering optical and stability behavior [11855-7]

 

Award sponsor:

Photronics

Students: get financial support to attend

Learn about student opportunities, including scholarships to help cover the cost of registration, travel, and lodging to attend the conference.