29 September - 3 October 2024
Monterey, California, US

BACUS Technical Group

Advancing photomask technology

BACUS (Bay Area Chromium Users Society) is an international professional organization for mask makers, equipment suppliers, and mask users, dedicated to advancing the technology and commercial application of masks for microlithography.

Two BACUS members smiling and networking at an SPIE event

BACUS newsletters archive

These publications provide updates on business and technical issues for the photomask community. Visit the BACUS News page to browse archives, spanning from January 2010 to December 2023.

BACUS Scholarship

Support for students

BACUS sponsors a yearly scholarship to a full-time undergraduate or graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies.

Missed the last webinar? Watch the recording

Alternative mask absorbers for EUV lithography

In this BACUS quarterly, Claire van Lare of ASML presents on mask materials pertaining to imaging, covering both low and high NA.

BACUS-sponsored webinars: recordings

Photomask in new technologies

In this BACUS quarterly webinar recording, Larry Melvin presents on how photomask technology can support progress in AR/VR hardware.

Full access to all previous webinars

Never miss another webinar you wished you'd attended. Access the full archive of past webinars with a free SPIE account. 

By creating a free SPIE account, you will have access the the full archive of SPIE webinar recordings on many important topics. You can also update your preferences to receive newsletters that keep you connected with your technical community. Sign up for a free SPIE account and enjoy access to research, discoveries in emerging technology, and updates from engineering project from around the globe. 

Watch photomask and lithography webinars

Learn about BACUS

Founded in 1980 by a group of chrome blank users wanting a single voice to interact with suppliers, BACUS has grown to become the largest and most widely known forum for the exchange of technical information in the field of photomask applications, manufacturing, research, and development. BACUS joined SPIE in January of 1991 to expand the exchange of information with photomask manufacturers around the world as well as with the external design enhancement community and end users of the products.
The group sponsors an informative monthly meeting and newsletter, BACUS News. The SPIE/BACUS Annual Photomask Technology Symposium covers photomask technology focused on the infrastructure necessary to advance and enhance the technology going forward. This includes fundamental photomask processes; materials, resist, lithography, etch, clean, metrology, inspection, repair, quality, and manufacturing management. In addition, phase shift mask technology for enhanced imaging for critical layer patterning has opened opportunities to collaborate with the lithography community and has been well integrated into the charter of the BACUS group. Forward looking concepts of design for manufacturing involving photomask technology is currently well under way with extensive activity in rigorous simulations of true photomask optical and physical attributes.
The evolution of BACUS into a synergistic organization of design, application, and photomask manufacturing is an exciting opportunity to bridge several interactive fields. BACUS continues to promote this effort through a strong community consisting of individuals who are interested in further integrating technology to drive the community forward.