Paper 13216-4

Etching approaches for next generation EUV photomask materials (Invited Paper)

30 September 2024 • 1:40 PM - 2:00 PM PDT | Monterey Conf. Ctr., Steinbeck 2

Jeff Chen

Applied Materials, Inc. (United States)

Application tracks: Non-IC Mask Applications

Presenter/Author

Jeff Chen

Applied Materials, Inc. (United States)

Author

Rebecca Stern

Applied Materials, Inc. (United States)

Author

Rao Yalamanchili

Applied Materials, Inc. (United States)

Author

Yohei Ikebe

HOYA Corp. (Japan)

Author

Takahiro Onoue

HOYA Corp. (Japan)

Author

HOYA Corp. (Japan)