Conference 13216 Paper 13216-4 Paper 13216-4 Etching approaches for next generation EUV photomask materials (Invited Paper) 30 September 2024 • 1:40 PM - 2:00 PM PDT | Monterey Conf. Ctr., Steinbeck 2 Add to My Schedule Abstract Authors Abstract Presenter Jeff Chen Applied Materials, Inc. (United States) Application tracks: Non-IC Mask Applications Presenter/Author Jeff Chen Applied Materials, Inc. (United States) Author Rebecca Stern Applied Materials, Inc. (United States) Author Rao Yalamanchili Applied Materials, Inc. (United States) Author Yohei Ikebe HOYA Corp. (Japan) Author Takahiro Onoue HOYA Corp. (Japan) Author Bryan Kasprowicz HOYA Corp. (Japan)