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Dr. Alex Zepka

Staff Engineer
Synopsys Inc


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Area of Expertise: E-Beam Lithography, Proximity Correction, Direct-Write Lithography, Mask Data Prep, Mask Error Correction
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Summary
I have been working as the technical lead in several projects in the area of E-Beam Proximity Correction and Data Preparation for New Generation Lithography (NGL). I have extensive experience in customer support as well as technology development. I was one of the Group Leader in the European-sponsored MAGIC project, managing the software datapath development for Multi-Beam Direct-Write technology. I have a similar role in the IMAGINE project for MBDW as well as other efforts in NGL
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