Participate in SPIE Advanced Lithography 2009

Plan to attend and see presentations on:

• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography XXIII
• Advances in Resist Materials and Processing Technology XXVI
• Optical Microlithography XXII
• Design for Manufacturability through Design-Process Integration III

Abstract submissions are now closed. The Advance Program will be available online 1 November 2008.

Download Call for Papers PDF (542 kb)

This unique international symposium offers many opportunities to network with colleagues from a variety of disciplines in academia, industry, and government.

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

See cutting edge presentations
Many of the enabling technologies that ultimately drive R&D in the field of semiconductor microlithography derive from the research presented at SPIE Advanced Lithography. Don't miss the opportunity to see important research on topics such as EUV, smart metrology, resist materials, processing technology, and design.

Collaborate with your colleagues
Bringing important research to market depends on the collaborative effort of colleagues in different locations, often working in different disciplines. SPIE Advanced Lithography draws over 4,000 of the most talented researchers and managers working in the lithography industry. Join your colleagues and work together to bring move your field forward.

Keep abreast of Technology Changes through Courses + Training
Begin planning to extend your education at SPIE Advanced Lithography. Leading experts in the field will keep you and your team current on our fast-changing technologies.

Read the Chair Invitation for more information about this event.

Sponsor

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