Participate in SPIE Advanced Lithography 2009

Submit an abstract to any of the
following Conferences:

• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography XXIII
• Advances in Resist Materials and Processing Technology XXVI
• Optical Microlithography XXII
• Design for Manufacturability through Design-Process Integration III

Submit an abstract by 11 August

This unique international symposium offers many opportunities to network with colleagues from a variety of disciplines in academia, industry, and government.

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

Present your work
Many of the enabling technologies that ultimately drive R&D in the field of semiconductor microlithography derive from the research presented at the SPIE Advanced Lithography. Don't miss the opportunity to present your important research on topics such as EUV, smart metrology, resist materials, processing technology, and design to colleagues and industry leaders.

Collaborate with your colleagues
Bringing important research to market, now more so than ever, depends on the collaborative effort of colleagues in different locations, often working in different disciplines. SPIE Advanced Lithography draws over 4,000 of the most talented researchers and managers working in the lithography industry. Join your colleagues and work together to bring your research forward.

Keep abreast of Technology Changes through Courses + Training
Begin planning to extend your education at SPIE Advanced Lithography. Leading experts in the field will keep you and your team current on our fast-changing technologies.

Plan now to present your research. Submit your abstracts by 11 August 2008.

Read the Chair Invitation for more information about this event.

Sponsor

Cooperating Organization