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25 - 30 January 2025
San Francisco, California, US
Course SC011

Design of Efficient Illumination Systems

Sunday, 26 January 2025 • 1:30 PM - 5:30 PM PST
Level: Intermediate
Member: $425.00
Non-member: $505.00
Student member: $242.00
Early Bird pricing valid until 10 January 2025
Illumination systems are included in fiber illuminators, projectors, and lithography systems. The design of an illumination system requires balancing uniformity, maximizing the collection efficiency from the source, and minimizing the size of the optical package. These choices are examined for systems using lightpipes, lens arrays, faceted optics, tailored edge rays designs, and integrating spheres through a combination of computer simulations, hardware demonstrations and discussions.

Learning Outcomes

  • describe the differences between illuminance, intensity and luminance
  • compute the required source luminance given typical illumination system specifications
  • compute the change in luminance introduced by an integrating sphere
  • distinguish between a Kohler illuminator and an Abbe illuminator
  • explain the difference in uniformity performance between a tailored edge ray reflector and a standard conic reflector
  • design a lightpipe system to provide uniform illuminance
  • design a lens array system to create a uniform illuminance distribution
  • design a reflector with facets to create a uniform illuminance distribution

Audience

Individuals who design illumination systems or need to interface with those designers will find this course appropriate. Previous exposure to Optical Fundamentals (Reflection, Refraction, Lenses, Reflectors) is expected.

Instructor

William J. Cassarly - Synopsys, Inc. (United States)
William J. Cassarly is a Synopsys Scientist at Synopsys (formerly Optical Research Associates). Before joining ORA 19 years ago, Cassarly worked at GE for 13 years, holds 48 US patents, and has worked extensively in the areas of illumination system design, sources, photometry, light pipes, and non-imaging optics. Bill was awarded the GE Corporate 'D. R. Mack Advanced Course Supervisor Award' for his efforts in the training of GE Engineers and is an SPIE Fellow.

Additional notes

Attendee testimonial:
Very interesting and informative course!
Great instructor, very good explanations in a limited time.