Micro/Nano Lithography

A new step toward full on-chip integration of active elements (single-photon detectors) and passive elements (quantum photonic circuits) enables important functionalities in quantum information processing.

An electron beam lithography and plasma etching process enables hands-free folding of functional metal-patterned dielectric structures with nanoscale dimensions.

A novel patterning technique directly forms 29nm-pitch fins etched into silicon on insulator, making logic and memory components.

A simplified nanoscale etching model reveals how resist sidewall roughness is transferred to the substrate, and suggests simple rules of thumb.

A nanoscale pit can correct both the amplitude and phase effects of multilayer defects in extreme UV lithography.

Simulation-based techniques extend the limits of lithography for applications that benefit from the cost advantage of mask aligners and their capability to print on large and non-planar substrates.

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