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2014 Photomask Technology | Call for Papers

SPIE DSS EXPO 2014 | ALIO - Booth #332

Gold Open Access option for SPIE Journals

SPIE PRESS



Micro/Nano Lithography

Hybrid lithography for x-ray diffractive optical elements
Combining several types of lithography enables fabrication of x-ray diffractive optical elements with high aspect ratio and high fidelity.
Synchrotron radiation spectroscopy enables analysis of chemical reactions that increase the sensitivity of extreme UV photoresists for patterning semiconductor materials.
16 April 2014
Coarse-grained modeling of copolymer materials provides physical insights into the equilibrium thermodynamics, structure, and kinetics of directed self-assembly for patterning at the nanoscale.
19 March 2014
Combination lithography using electron-beam or extreme-UV pattern exposure with UV flood exposure can achieve a near-10-fold increase in resist sensitivity with no loss in other properties.
13 March 2014
Combining photoresist polymers, lithography, and ink-jet printing allows fabrication of microlenses with unique features.
12 February 2014
A model-based scheme for characterizing mask features may enhance semiconductor pattern placement, enabling manufacturers to meet shrinking lithography error budgets and improve production yields.
10 February 2014
 
Michael Lercel: Sematech and the next generation of lithography