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CASIS

2015 Advanced Lithography | Register Today!

Journal of Micro/Nanolithography, MEMS, and MOEMS

SPIE PRESS



Micro/Nano Lithography

The semiconductor industry relies on perpetual miniaturization, and for this to continue requires a holistic approach to the entire lithography process and a move to extreme UV lithography.
19 December 2014

Success stories from teachers show that STEM curriculum using the scanning electron microscope excites their students and improves academic performance.

3 December 2014

Direct femtosecond laser writing can produce computer-designed structures at a resolution beyond the diffraction limit.

5 November 2014

A new technique using high-index glasses enables photonic device integration on substrates such as semiconductors, glasses, IR crystals, polymers, and graphene.

30 October 2014

A hybrid patterning system combining projection and interference lithography enables the fabrication of 14-inch 3D images.

27 October 2014

A simple and versatile synthesis platform enables the preparation of engineered hybrid spin-on materials and micro and nanostructured surfaces for fast and inexpensive development of miniaturized devices.

30 September 2014