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Information for:
2012 Advanced Lithography | Register Today

Journal of Micro/Nanolithography, MEMS, and MOEMS

SPIE PRESS




Micro/Nano Lithography

Recent progress in chemically amplified extreme UV resist technology
Chemically amplified extreme UV resist has the potential to achieve 15nm half-pitch resolution.
Numerical lithography approaches in micromanufacturing make it possible to complement or replace test exposures and to optimize mask layouts and illumination systems.
30 January 2012
Micro-optoelectromechanical systems for space-based instrumentsA silicon-based micromirror array is tested for operation at 92K, and a commercial array for a space evaluation program is presented.
30 January 2012
Measurement uncertainty quantifies performance-related doubt and evaluates the reliability of a direct laser lithography system.
20 January 2012
Rare earths are critical for optical polishingThe cost and availability of these important materials have had their ups and downs. The optics industry is using several strategies to make sure future needs are met.
9 January 2012
Reliably analyzing and modeling transduction processes is key to optimizing piezoelectric energy harvesters as viable alternative power sources to batteries in miniaturized devices.
29 December 2011
 
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