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Micro/Nano Lithography & Fabrication

Accurate top-down processing of silicon photonic devices
Combining electron-beam lithography, inductively coupled plasma etching, and atomic-layer-deposition techniques achieves carefully controlled fabrication of nanophotonic devices.
A systematic review of technologies currently under investigation identifies nanocrystalline diamond as the most promising material for miniaturization of transceivers.
17 March 2010
Vacuum-UV radiation is useful for surface microanalysis and has enabled development of a new, high-quality chemical vapor-deposition technique operating near room temperature.
11 February 2010
An innovative micromagnetic height adjuster serves as both actuator and sensor.
19 January 2010
Optical electrostriction in microelectromechanical systems enables vibration at 11GHz and allows resonance frequency scaling with wavelength rather than device size.
19 January 2010
Interconnecting microelectromechanical systems directly to printed circuit boards can improve reliability and reduce costs of medium-caliber fuzes.
6 January 2010
 
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