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SPIE Startup Challenge 2015 Lead Sponsor - HAMAMATSU

CASIS

2015 Advanced Lithography | Call for Papers

Journal of Micro/Nanolithography, MEMS, and MOEMS

SPIE PRESS



Micro/Nano Lithography

Vectorial resolution enhancement: better fidelity for immersion lithography

Resolution enhancement based on vectorial and multi-parameter co-optimization reduces the complexity and fabrication cost of pixelated masks and sources for lithography.

A simple and versatile synthesis platform enables the preparation of engineered hybrid spin-on materials and micro and nanostructured surfaces for fast and inexpensive development of miniaturized devices.

30 September 2014

Critical dimension inspection based on a library of simulated through-focus diffraction patterns and a mechanical-free defocusing process could improve high-throughput quality control.

22 September 2014

High-performance photoresists made from metal oxide nanoparticles offer high-sensitivity lithography at extreme-UV wavelengths by using a new ligand-based patterning mechanism.

15 September 2014
Ultraviolet light and nanospherical-lens lithography together fabricate large-area nano-ellipse arrays.
30 July 2014
Helium ion microscopy is able to produce gaps less than 5nm in width and narrow bridges in plasmonic nanostructures.
22 July 2014
 
Armin Knoll: 3D nanofabrication using heatable probes