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Read sample pages from Advanced Processes for 193-nm Immersion Lithography, by Yayi Wei and Robert L. Brainard



Micro/Nano Lithography & Fabrication

Dual-beam, 3D photolithography provides exceptional resolution
An ultrafast laser is used to initiate multiphoton absorption polymerization, while a second, spatially shaped, continuous wave laser selectively deactivates polymerization to enhance the resolution.
An extreme-high-resolution instrument is opening up new possibilities for industrial and research applications, expanding what was previously thought possible.
10 June 2009
Multiscale simulations, including nonclassical effects, predict a fundamental scaling limit for micro-electromechanical systems.
5 June 2009
A dedicated finite-element solver enables accurate and fast simulations of light interaction with metallic nanostructures.
2 June 2009
Laser-interference and laser microlens-array lithography provide significant resolution advances towards high-speed nanomanufacturing.
27 May 2009
An advanced simulation supports semiconductor manufacturing and facilitates the development of new patterning techniques for micro- and nanodevices.
27 May 2009
 
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