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2015 Photomask Technology | Register Today

SPIE Advanced Lithography 2016|Call for Papers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Celebrate the International Year of Light 2015 with 15% off printed books and proceedings. Shop now.



Micro/Nano Lithography

Mask absorber optimization for enhanced microlithography
A fundamental understanding of 3D photomask-induced phase effects is required to determine the best absorber for particular lithographic purposes.
Harnessing millimeter-sized liquid droplets enables fabrication of high-power solid lenses of varying focal lengths for use in mobile devices.
6 May 2015
Laser-induced transfer technology can print very small and delicate objects for applications in nanophotonics and tissue engineering.
30 March 2015
Femtosecond laser microfabrication enables rapid prototyping and development of novel microfluidic platforms with biological applications.
27 March 2015

Using focused light beams to suspend and autonomously control microscopic tools in 3D enables novel ways to investigate the microscale world.

3 March 2015
A dedicated UV nanoimprint lithography system realizes 2D binary subwavelength gratings at optical fiber tips.
12 February 2015
 
Laura Waller: Integrating optics and processing in design of imaging systems

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