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2015 Photomask Technology | Register Today

SPIE Advanced Lithography 2016|Call for Papers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Celebrate the International Year of Light 2015 with 15% off printed books and proceedings. Shop now.



Micro/Nano Lithography

Optimizing the quality and manufacture of nanocircuits
Nanoelectronic circuits can be written directly onto oxide semiconductors by tuning the local conductivity with a high-pressure atomic-force-microscope tip.
A numerical simulation approach includes optical, thermal, and mechanical sub-models to investigate the mechanism for the pulse duration efficiency dependence.
21 August 2015
Production of 3D graphene scaffolds with micron-scale pores by lithography using UV lasers enables the design of carbon electrodes for advanced electrochemical applications.
25 July 2015
Direct femtosecond laser writing of dielectric crystals enables the fabrication of 3D waveguiding structures as passive or active photonic devices operating from near-UV to mid-IR bands.
24 July 2015
Cryoetching that minimizes plasma-induced carbon depletion was successfully tested on advanced low-k materials used in back-end-of-the-line CMOS technology.
7 July 2015
A fundamental understanding of 3D photomask-induced phase effects is required to determine the best absorber for particular lithographic purposes.
17 June 2015
 
Dirk Englund: Developing quantum technologies in scalable semiconductor systems