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2015 Photomask Technology | Call for Papers

Journal of Micro/Nanolithography, MEMS, and MOEMS

SPIE PRESS



Micro/Nano Lithography

Multicolor lithography
Using multiple colors of visible light for photolithography exposure may ultimately rival the resolution of extreme-UV lithography at a fraction of the cost.
A dedicated UV nanoimprint lithography system realizes 2D binary subwavelength gratings at optical fiber tips.
12 February 2015
A technique for quickly removing solar cells from their fabrication base, incorporating hydrophilic additives in the lift-off etchant, promises less-expensive, better-performing photovoltaic devices.
5 February 2015
On-chip terabit-scale digital signal transmission and low-distortion analog signal transmission can be achieved with favorable performance using ultra-compact silicon photonic devices.
12 January 2015
The semiconductor industry relies on perpetual miniaturization, and for this to continue requires a holistic approach to the entire lithography process and a move to extreme UV lithography.
19 December 2014

Success stories from teachers show that STEM curriculum using the scanning electron microscope excites their students and improves academic performance.

3 December 2014
 
Volker Sorger: Plasmonics enables more efficient silicon photonics

Applied Materials

Ross Optical Industries