 A new step toward full on-chip integration of active elements (single-photon detectors) and passive elements (quantum photonic circuits) enables important functionalities in quantum information processing. 10 May 2013
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 An electron beam lithography and plasma etching process enables hands-free folding of functional metal-patterned dielectric structures with nanoscale dimensions. 11 April 2013
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 A novel patterning technique directly forms 29nm-pitch fins etched into silicon on insulator, making logic and memory components. 5 April 2013
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 A simplified nanoscale etching model reveals how resist sidewall roughness is transferred to the substrate, and suggests simple rules of thumb. 29 March 2013
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 A nanoscale pit can correct both the amplitude and phase effects of multilayer defects in extreme UV lithography. 18 March 2013
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 Simulation-based techniques extend the limits of lithography for applications that benefit from the cost advantage of mask aligners and their capability to print on large and non-planar substrates. 15 March 2013
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