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SPIE Startup Challenge 2015 Lead Sponsor - HAMAMATSU

CASIS

2015 Advanced Lithography | Register Today!

Journal of Micro/Nanolithography, MEMS, and MOEMS

SPIE PRESS



Micro/Nano Lithography

Direct femtosecond laser writing can produce computer-designed structures at a resolution beyond the diffraction limit.

5 November 2014

A new technique using high-index glasses enables photonic device integration on substrates such as semiconductors, glasses, IR crystals, polymers, and graphene.

30 October 2014

A hybrid patterning system combining projection and interference lithography enables the fabrication of 14-inch 3D images.

27 October 2014

A simple and versatile synthesis platform enables the preparation of engineered hybrid spin-on materials and micro and nanostructured surfaces for fast and inexpensive development of miniaturized devices.

30 September 2014

Critical dimension inspection based on a library of simulated through-focus diffraction patterns and a mechanical-free defocusing process could improve high-throughput quality control.

22 September 2014

Resolution enhancement based on vectorial and multi-parameter co-optimization reduces the complexity and fabrication cost of pixelated masks and sources for lithography.

18 September 2014