Paper 12995-27
Paper 12995-27
The exploration of novel 3D lithography by utilizing the electron beam driving
On demand | Presented live 9 April 2024 
Abstract
The growing maturity of 3D printing technologies has been reshaping the landscape of numerous fields. Concurrently, the pursuit of large-scale additive manufacturing with enhanced precision and substantial throughput remains a central objective. This study introduces a high-resolution 3D printing technique for quartz glass, achieved through the fusion of transparent Hydrosiloxane (HSQ) printing materials and electron-beam additive manufacturing technology. Introducing a novel concept in 3D lithography, we present the development of an HSQ-based ink that enables the fabrication of large-area 3D photonic crystal structures at a scale of hundred nanometers, utilizing an electron beam driving force distinct from conventional optical technology. This work attempts to find alternative technologies for optical printing and provide new ideas for high-precision 3D printing of silica inorganic materials.
Presenter
Zhenjiang Li
Shanghai Institute of Applied Physics (China), Univ. of Chinese Academy of Sciences (China)
Zhenjiang Li, a PhD student at the Shanghai Institute of Applied Physics, Chinese Academy of Sciences, focuses on extreme fabrication by using high-energy beam such as X-ray beams and high energy electron beams. His innovative work is fabrication of experimentally validated interference lithography masks, which were used to evaluate the performance of 5nm process node EUV photoresist. Zhenjiang actively engages in academic conferences, including Academic Conference of the Chinese Optical Society and 4th Optics Young Scientist Summit. He aspires to advance cross application of micro and nano manufacturing methods, fostering global collaboration and knowledge sharing.