Times are all Pacific Standard Time (UTC - 8:00)

1:00 PM
Keynote

Christine Thanner Technology Development EV Group (Austria)

Nanoimprint (Lithography) – Small Impressions with Huge Impact
Wafer-level nanoimprint lithography (NIL) has increasingly become a key enabling technology that supports the manufacturing of new devices and applications across the photonics industry. Being the most precise replication technique, NIL has proven to be ideally suited for facilitating the patterning of structures with challenging complex geometries as well as high-resolution features down to sub-100nm resolution. A key advantage of NIL is the straightforward pattern transfer of e.g. optical components with advanced patterning requirements into the bulk substrate material as complex multi-height structures can be replicated with high fidelity over a large area in a single imprinting and single etching step. Crucial for the fabrication of these highly individual and best performing optical structures is a matching combination of mastering techniques, replication equipment and processes including qualified imprint materials. This talk reviews the capabilities of Nanoimprintlithography nowadays and addresses a path from proto-typing using a single DIE master to a fully populated wafer-level master required for production. Factors ensuring a mature high-volume production compatible replication of optical structures by UV NIL will be discussed with respect to equipment requirements and material properties.