• Advanced Lithography 2016
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2016
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SPIE Advanced Lithography, the #1 conference for the lithography community

Call for Papers for SPIE Advanced Lithography in San Jose, California, USA

Present and publish at SPIE Advanced Lithography 2016, the world's premier semiconductor lithorgraphy event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.  

Call for Papers now open online. Click on the links below to submit your abstract.
Call for Papers (PDF coming soon)

2016 Paper Topics
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
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A look back at the 2015 Event
2015 Event News and Photos
2015 Final Technical Program (4 MB PDF)
2015 Technical Abstracts (1 MB PDF)
2015 Exhibition Guide (2 MB PDF)


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Advanced Lithography
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

We welcome your participation.


Join SPIE in celebration of:

 

Why authors present their work at SPIE Advanced Lithography:

“For anyone working in lithography it is exactly the correct audience.”
“The most important symposium on lithography.”
“Best forum to gain attention from industry decision-makers.”
Exhibition

SPIE Advanced Lithography Exhibition, 24 - 25 February, is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. 61 exhibiting companies in 2014.

 • Connect with the largest gathering of lithography experts in the world (2,300 attendees from 31 countries including the US, Japan, Germany, Taiwan, Korea, Netherlands, Isreal, and China)
 • Get face-to-face interaction with potential customers from 5 days of presentations, courses, and special events
 • Access to free business and industry events

SPIE.TV: The latest advances in lithography

See what happened last year
 • See what happened in 2014: onsite news and photos
 • Technical Program (PDF 6 MB)
 • Exhibition Guide (PDF 4 MB)
 • Technical Abstracts (PDF 2 MB)


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Advanced Lithography
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

We welcome your participation.

Sponsor

SPIE logo

Important Author Dates

Abstract Due Date
8 September 2015

Author Notification
22 October 2015

Manuscripts Due
25 January 2016


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