25 - 29 February 2024
San Jose, California, US

Information for authors and presenters

Instructions, important dates, and other information for a successful conference experience

Plan to attend

Find important information for author presenters.

Most conferences are accepting post-deadline submissions until 8 January 2024. New submissions are considered as space becomes available. View the conference you want to participate in to find out if it is accepting post-deadline submissions.

Why present and publish your work as part of Advanced Lithography + Patterning?

Here's how submitting an abstract puts a spotlight on your work:

  • Your participation in the conference gains you international visibility
  • Your research becomes a part of the world's permanent scientific record
  • Your work will be indexed in all relevant scientific databases*

Make sure that your research gets timely publication in the SPIE Digital Library.

*SPIE partners with relevant scientific databases to ensure visibility for your research, including Astrophysical Data System (ADS), Ei Compendex, CrossRef, Google Scholar, Inspec, Scopus, and Web of Science Conference Proceedings Citation Index.

Important dates

Abstracts due 13 September 2023
Registration opens November 2023
Author notified and program posts online 20 November 2023
Submission system opens for manuscripts and poster PDFs* 8 January 2024
Poster PDFs due for spie.org preview and publication 31 January 2024
All manuscripts due 7 February 2024
Advance upload deadline for oral presentation slides** 23 February 2024

*Contact author or speaker must register prior to uploading
**After this date slides must be uploaded onsite at Speaker Check-In