Paper 13111-72
Paper 13111-72
Methodology for robust process window discovery in plasmonic nanostructures
19 August 2024 • 5:30 PM - 7:00 PM PDT | Conv. Ctr. Exhibit Hall A
Abstract
We explore improved plasmonic nanostructure fabrication using process and experiment design methodologies using a DOE and process tracking tool PanMo-Confab. This methodology is shown to yield a robust process window in case of plasmonic nanostructure fabrication and a faster time to optimal design and response variable tuning.
Presenter
Muthiah Annamalai
PanMo LLC (United States)
Dr. Annamalai earned his Ph.D. (2011) from UT Arlington for researches in Quantum and Nonlinear optics and Plasmonic nanostructures. Since 2012 he has been a electronic-design automation engineer, presently in Silicon Valley.