Development status of nanoimprint templates for advanced semiconductor devices (Invited Paper)

Nanoimprint lithography, NIL, is attracting attention again as the next generation lithography. Its advantages of higher resolution to ArF-i lithography and lower cost-of-ownership and power consumption to EUVL are still sought for the development of sustainable semiconductor manufacturing technology. For years, we have developed E-beam written template and its replication technology by NIL simultaneously. In this presentation, we will report on our newly developed works that bring our template performance to the requirements of advanced device manufacturing from the aspects of resolution and defectivity.