Advancements in space-based NUV spectrography: precision fabrication and evaluation of an optical slit using optical lithography and deep reactive ion etching

The field of ultraviolet (UV) spectroscopy has long been instrumental in unravelling the mysteries of our universe, shedding light on the fundamental processes governing celestial objects and terrestrial phenomena. In this context, the development of advanced spectrographic instruments is pivotal to enhancing our understanding of these spectral signatures. Recent years have witnessed significant progress in UV spectroscopy, driven by advancements in technology and materials science. One crucial element of UV spectrography is the optical slit, which plays a pivotal role in determining the spectral resolution and overall performance of a spectrograph. Traditional fabrication methods for optical slits often face limitations in precision, throughput, and reproducibility.