7 - 10 October 2024
San Ramon, California, US
Conference 12726 > Paper 12726-47
Paper 12726-47

Determining the bandgap dependence of nonlinear absorption and laser induced damage threshold through numerical simulation and experiment

On demand | Presented live 20 September 2023

Abstract

Nonlinear absorption is mainly governed by mechanisms involving excitation processes of electrons. Typically, two phenomena are considered when discussing nonlinear absorption; the multiphoton absorption where multiple photons interact directly with a single electron, and tunnel ionization, where the high electric field results in a shifting of the bandgap allowing an electron to tunnel into the conduction band. Electrons in the conduction band can be accelerated through the absorption of further photons until they obtain enough energy to excite further electrons to the conduction band, leading to runaway absorption and finally damage of the sample. By laser calorimetric measurement of the nonlinear absorption, it is expected that the laser damage threshold can be predicted without damaging the optic. Before accurate predictions can be made, the process must be thoroughly characterized and understood. The nonlinear behavior of the absorption was demonstrated with potential increases in absorption of an order of magnitude. Initial results show a noticeable impact of contaminants, though a nonlinear response is still observed.

Presenter

Joshua McCauley
Laser Zentrum Hannover e.V. (Germany)
I graduated Victoria University of Wellington in 2017 with a Bsc. in Mathematics and Physics. In 2021 I received a Masters Degree in Physics. My thesis focused on the numerical simulation of the interaction of optical pulses with graphene nano-flakes. I am currently working towards my PhD at the Laser Zentrum Hannover in Germany. My field of work involves the effects particle contamination has on optical thin films, and investigating the nonlinear behaviour of thin films.
Presenter/Author
Joshua McCauley
Laser Zentrum Hannover e.V. (Germany)
Author
Xiaochuan Ji
Tongji Univ. (China)
Author
Laser Zentrum Hannover e.V. (Germany)
Author
Tongji Univ. (China), Key Lab. of Advanced Micro-Structured Materials, Ministry of Education (China)
Author
Laser Zentrum Hannover e.V. (Germany)
Author
Laser Zentrum Hannover e.V. (Germany), Leibniz Univ. Hannover (Germany)