Ahmed Hamed received his B.Sc. and M.Sc. degrees in Electronics and Electrical Communications Engineering from Cairo University in 2007 and 2015, respectively. He received his Ph.D. degree in Integrated Circuits from Ain-Shams University, Cairo, Egypt in 2023. In 2013 Ahmed joined Mentor Graphics Cairo, now known as Siemens EDA. Since then, he has contributed to the development of EDA tools in the fields of Resolution Enhancement Techniques (RET), Optical Proximity Correction (OPC), Multi-Patterning (MP), and Design for Manufacturability (DFM) with over 15 publications in addition to a U.S. patent. Ahmed is currently working as a Senior Product Engineering Manager at Calibre Semi-Manufacturing Solutions and his current research focuses on ML modeling and applications for IC layout Design and Manufacturing. Ahmed has been a member of SPIE since 2013. He can be reached at ahmed.hamedfatehy@siemens.com
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