SPIE Photomask Technology 2012 | Mask Design, Mask Solutions, Mask Manufacturing, Emerging Technologies

The Call for Papers is now open for SPIE Photomask Technology 2012.
Sponsored by SPIE and BACUS, Photomask Technology is the premier conference and exhibition for the photomask industry, to be held 10 - 13 September, 2012, in Monterey, California, USA.

Call for Papers information:
•	Call for Papers details
•	Begin paper submission process

Suggested topics for paper submission:
Mask Making

•	Mask data preparation
•	Substrates and materials
•	Patterning tools and processes
•	Resist and resist processing
•	Etch techniques
•	Metrology
•	Inspection
•	Repair
•	Cleaning, contamination, and haze
•	Simulation of mask making

Emerging Mask Technologies

•	EUV mask making
•	EUV mask inspection and repair
•	EUV mask infrastructure
•	Nanoimprint mask making
•	Nanoimprint mask application
•	Pixelated masks
•	Alternative mask technologies
•	Mask process correction
•	Grey-scale masks
•	Direct-write, ML²

Mask Application

•	Double- and multi-patterning
•	Resolution enhancement techniques and OPC
•	Source and mask optimization
•	Design for manufacturability
•	Patterned media
•	Simulation and modeling

Mask Business

•	Mask manufacturing control
•	Mask shop management
•	Mask management in wafer fabs
•	Business aspects of mask
•	Infrastructure

Submit your abstract today. Abstracts due by 12 March, 2012.

THE PHOTOMASK TECHNOLOGY EXHIBITION
Don't miss this highly regarded exhibition for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry.
•	Learn more on the Exhibition website
•	Become an Exhibitor: View 2012 Exhibitor Contract (PDF)

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