• Photomask Technology 2014
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Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
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SPIE Photomask Technology Call for Papers Abstracts due date extended to 14 April

Call for Papers for SPIE Photomask Technology 2014 in Monterey, California, United States

Call for Papers for SPIE Photomask Technology 2014, the premier worldwide technical meeting for the photomask industry.

To accommodate the needs of the mask industry, the abstract due date has been extended to 14 April.

Browse the Program Call for Papers PDF >1 MB Sign-in to submit
your abstract
Papers will be accepted in these areas:
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
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Co-located with SPIE Scanning Microscopy 2014
New in 2014 - SPIE Photomask Technology will be co-located with SPIE Scanning Microscopy 2014, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopy
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
A look back at the 2013 event 
2013 Technical Program (PDF 1.6 MB)
2013 Technical Abstracts (PDF 1.0 MB)
Keynote Presentation: Delivering Complexity at the Frontier of Electronics, Michael C. Mayberry, Corporate VP of the Technology and Mfg. Group, Director of Components Research, Intel Corp.
Special Session Panel Discussion: Big Glass: Will 9-inch Glass Return? Moderator: Paul W. Ackmann, GLOBALFOUNDRIES Inc.
Networking events: Daily lunches, Exhibition/Poster Reception, Annual Photomask Reception
Exhibition: 10 - 11 September. Meet key suppliers of components, software, and manufacturing equipment in the mask industry
New for 2013 | Conference registration included onsite access to all available proceedings papers. See details


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Photomask Technology
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Publish in SPIE Proceedings
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We welcome your participation.


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Important Dates

Abstract Due Date
24 March 2014

Due Date Extended to
14 April 2014

Author Notifications
12 May 2014

Manuscripts Due
18 August 2014