• Photomask Technology 2015
    Invitation
    Conference
    Exhibition
    Sponsors
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
29 September - 1 October 2015
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Call for papers now available

SPIE Photomask Technology 2015 in Monterey, California, USA

Present and publish at SPIE Photomask Technology 2015, the premier worldwide technical meeting for the photomask industry.

Call for papers now open online. Submit your abstract.

Call for papers (295 KB PDF)

2015 Topics
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Co-located with SPIE Scanning Microscopy 2015
SPIE Photomask Technology will be co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
29 September - 1 October 2015
A look back at the 2014 event 
2014 Technical Program (PDF 3 MB)
2014 Technical Abstracts (PDF 300 KB)


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Photomask Technology
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

We welcome your participation.


Sponsors

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Important Author Dates

Abstract Due Date
13 April 2015

Author Notification
25 May 2015

Manuscripts Due
31 August 2015


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