• Photomask Technology 2013
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SPIE Photomask Technology 10 - 12 September 2013
Monterey Conference Center and Monterey Marriott
Monterey, California, United States

Advance Program will be online in June

Attend SPIE Photomask Technology this September in Monterey, California.

Join your peers in in Monterey, California for Photomask Technology, the leading meeting for mask professionals. This is your chance to exchange ideas, hear renowned speakers, and make valuable connections through the many networking and technical events.

2013 Program Overview
Advance Technical Program (coming soon)
Review online content in the links below.
Keynote Presentation: Delivering Complexity at the Frontier of Electronics, Michael C. Mayberry, Corporate VP of the Technology and Mfg. Group, Director of Components Research, Intel Corp.
Special Session Panel Discussion: Big Bad Glass: Will 9-inch Glass Return? Moderator: Paul W. Ackmann, GLOBALFOUNDRIES Inc.
A variety of networking events: Daily lunches, Exhibition/Poster Reception, Annual Photomask Reception
Exhibition: 10 - 11 September. Meet key suppliers of components, software, and manufacturing equipment in the mask industry
More than 100 presentations in these areas
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Browse the Program Subscribe to Updates

Attend SPIE Photomask, the largest international event for the mask industry - and it happens in beautiful Monterey, California, United States.

Photo slideshow from recent Photomask conferences


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Important Dates

Abstract Due Date
Please contact Pat Wight with late submission questions

Author Notifications
10 June 2013

Manuscripts Due
12 August 2013


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