• Photomask Technology 2014
    Special Events
    Travel to Monterey
    Onsite Services
    Registration Pricing + Details
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Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
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SPIE Photomask Technology 2014 Program

SPIE Photomask & Scanning Microscopies Final Program PDF

Attend SPIE Photomask Technology 2014, the premier worldwide technical meeting for the photomask industry.

Pre-registration is now closed, please register onsite.

Registration pricing and details View registration pricing and details
A variety of events, all in one week
Final Technical Program (3 MB PDF)
Technical Abstracts (300 KB PDF) Photomask only
Online Technical Program (more than 70 papers)
Special and technical events: keynote presentation, poster and exhibition reception, panel discussions, Photomask Reception, and more
Exhibition: Visit the Photomask show floor to see the latest products and technologies from a variety of companies

Keynote Presentation

 Martin van den Brink, President and CTO, ASML

Many ways to shrink: The right moves to 10 nanometer and beyond
Martin van den Brink,
President and CTO, ASML

With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.

More than 70 presentations in these areas
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
9-inch Glass:
Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
Browse the Program
Co-located with SPIE Scanning Microscopies 2014
New in 2014 - SPIE Photomask Technology will be co-located with SPIE Scanning Microscopies 2014, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
16 - 18 September 2014
A look back at the 2013 event 
2013 Technical Program (PDF 1.6 MB)
2013 Technical Abstracts (PDF 1.0 MB)


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Important Dates

Manuscripts Due

18 August 2014

For questions about your presentation or the meeting, contact Pat Wight, the Conference Program Coordinator.

For questions about your manuscript only, please contact Joel Shields, the Conference Proceedings Coordinator