Present your research at the most important worldwide technical event in the photomask industry

The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to present your research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

Submit your abstract to SPIE Photomask Technology

Download the SPIE Photomask Technology Call for Papers PDF

Solve the most pressing issues in:

Mask Infrastructure

• Materials
• Patterning
• Resist Processing
• Etch
• Inspection
• Cleaning
• Repair
• Metrology

Mask Integration

• Double patterning
• Design for Manufacturing/Process Integration and yield optimization
• Source/mask optimization
• Simulation and Tolerancing for Hyper-NA Applications
• Substrates and Materials
• Extreme NA/Immersion Applications
• Reticle Enhancement and Optical Proximity Effects
• Mask Data Preparation and Mask Rules Development
• Advanced RET
• DFM Opportunities for Fabless Applications
  

Emerging Mask Technology

• Double patterning
• EUV Mask Materials
• EUV Mask Infrastructure
• Imprint
• Gray Scale Technology
  

Mask Business

• Mask Business and Management
• Direct Write/Maskless Technology 
   

We welcome your participation!

Sponsors