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    Author Submission & Chair Review System

    33rd European Mask and Lithography Conference

    Dates: 22-29 June 2017
    Location: Dresden, Germany

    Submissions for EMLC 2017 will go through the SPIE Submission and Review System.

    Submit Your Abstract

    You will be asked to provide information about your submission, including complete author information.

    An account is required to submit an abstract for this conference. You can create an account when you click on the link below, or if you already have an SPIE account, you can sign in:

    EMLC 2017 

    **Abstract Due Date: March 31, 2017 New deadline: April 21, 2017
    Notification Date: April 30, 2017

    **Optional: Authors may submit a 2-page abstract file including supplemental information such as images/tables/figures. The 2-page abstract file is not required.

    If the paper is accepted, the author will return to the website to submit a final manuscript by June 27, 2017 for publication in the EMLC 2017 conference proceedings. Manuscript submission instructions will be included in the acceptance notification.

    If you have already submitted, click here to

    Complete, Revise, or View Status of Your Submission


    Manage Your Active Submissions

    Chairs and Committee Members: Access and review submissions.

    Authors: Complete your submission, submit a revision, or view the status of your submission.

    If you have questions about the submission process, please contact Jenny Woods, SPIE Proceedings Coordinator,, or call +1 360 676 3290. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.

    If you have questions about the meeting, please see the meeting website at