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Proceedings Paper

A Totally Aqueous Developable Bilayer Resist System
Author(s): Mark P. de Grandpre; David A. Vidusek; Michael W. Legenza
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Paper Abstract

An aqueous developable two layer resist system has been developed using a poly(dimethylglutarimide) (PMGI) based planarizing layer. This material offers better resistance to dry etching and thermally induced flow than PM M A. The PMGI layer is highly solvent resistant so no interfacial mixing with conventional positive resist top layers is observed. The pattern transfer exposure wavelengths for the PMGI are 240 - 280 nm. Dyes were added to the novolak based top layer to ensure optimum deep UV masking for thicknesses less than one micron.

Paper Details

Date Published: 18 April 1985
PDF: 12 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985);
Show Author Affiliations
Mark P. de Grandpre, Rohm and Haas Company (United States)
David A. Vidusek, Shipley Company (United States)
Michael W. Legenza, Shipley Company (United States)

Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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