
Proceedings Paper
Experimental and numerical investigations on the density profile of CO2 laser-produced Sn plasma for an EUVL sourceFormat | Member Price | Non-Member Price |
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Paper Abstract
Experimentally observed density profile of CO2 laser-produced Sn plasma was compared with that predicted by one
dimensional hydrodynamic radiation numerical code. Experimental data showed a much smaller corona and a much
shorter shift distance of the critical density from the initial target surface as compared with those predicted by an
isothermal model and the numerical simulation. The possible reason may come from thin localized laser deposition
region, less energy transport into the corona and into the dense region beyond the critical density. This research suggests
that more efforts to understand the fundamental dominating the interaction of CO2 laser with high Z plasma are
necessary to form a more solid foundation for the application of numerical method to the development of the EUVL
source.
Paper Details
Date Published: 20 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76360D (20 March 2010); doi: 10.1117/12.848407
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76360D (20 March 2010); doi: 10.1117/12.848407
Show Author Affiliations
Y. Tao, Univ. of California, San Diego (United States)
Y. Ueno, Univ. of California, San Diego (United States)
Hiratsuka Research and Development Ctr. (Japan)
S. Yuspeh, Univ. of California, San Diego (United States)
R. A. Burdt, Univ. of California, San Diego (United States)
Y. Ueno, Univ. of California, San Diego (United States)
Hiratsuka Research and Development Ctr. (Japan)
S. Yuspeh, Univ. of California, San Diego (United States)
R. A. Burdt, Univ. of California, San Diego (United States)
N. Amin, Univ. of California, San Diego (United States)
Univ. of Agriculture (Pakistan)
N. M. Shaikh, Univ. of California, San Diego (United States)
Univ. of Sindh (Pakistan)
M. S. Tillack, Univ. of California, San Diego (United States)
F. Najmabadi, Univ. of California, San Diego (United States)
Univ. of Agriculture (Pakistan)
N. M. Shaikh, Univ. of California, San Diego (United States)
Univ. of Sindh (Pakistan)
M. S. Tillack, Univ. of California, San Diego (United States)
F. Najmabadi, Univ. of California, San Diego (United States)
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
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