
Proceedings Paper
Modeling of light intensification by conical pits within multilayer high reflector coatingsFormat | Member Price | Non-Member Price |
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Paper Abstract
Removal of laser-induced damage sites provides a possible mitigation pathway to improve damage resistance of coated
multilayer dielectric mirrors. In an effort to determine the optimal mitigation geometry which will not generate
secondary damage precursors, the electric field distribution within the coating layers for a variety of mitigation shapes
under different irradiation angles has been estimated using the finite difference time domain (FDTD) method. The
coating consists of twenty-four alternating layers of hafnia and silica with a quarter-wave reflector design. A conical
geometrical shape with different cone angles is investigated in the present study. Beam incident angles range from 0° to
60° at 5° increments. We find that light intensification (square of electric field, |E|2) within the multilayers depends
strongly on the beam incident direction and the cone angle. By comparing the field intensification for each cone angle
under all angles of incidence, we find that a 30° conical pit generates the least field intensification within the multilayer
film. Our results suggest that conical pits with shallow cone angles (≤ 30°) can be used as potential optimal mitigation
structures.
Paper Details
Date Published: 31 December 2009
PDF: 9 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040M (31 December 2009); doi: 10.1117/12.836916
Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)
PDF: 9 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040M (31 December 2009); doi: 10.1117/12.836916
Show Author Affiliations
S. Roger Qiu, Lawrence Livermore National Lab. (United States)
Justin E. Wolfe, Lawrence Livermore National Lab. (United States)
Anthony M. Monterrosa, Univ. of California, Berkeley (United States)
Justin E. Wolfe, Lawrence Livermore National Lab. (United States)
Anthony M. Monterrosa, Univ. of California, Berkeley (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Thomas V. Pistor, Panoramic Technology Inc. (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Thomas V. Pistor, Panoramic Technology Inc. (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)
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