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Proceedings Paper

Sub-40-nm half-pitch double patterning with resist freezing process
Author(s): Masafumi Hori; Tomoki Nagai; Atsushi Nakamura; Takayoshi Abe; Gouji Wakamatsu; Tomohiro Kakizawa; Yuusuke Anno; Makoto Sugiura; Shiro Kusumoto; Yoshikazu Yamaguchi; Tsutomu Shimokawa
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Paper Abstract

Double patterning based on existing ArF lithography technology is one of the most promising candidates for sub-40nm half-pitch devices. Several variation of double patterning processes have been reported by research groups, including a dual-trench process (litho-etch-litho-etch) and a dual-line process (litho-litho-etch). Between these, the dual-line process is attracting the most attention because it is a simple process that achieves high throughput. However, there is concern that the second lithographic process damages the first litho patterns in the dual-line process. Therefore, new technology must be developed to keep the configuration of first litho patterns during the second lithographic step for this patterning process to be practical. Recently, we have succeeded in forming sub-40nm half-pitch litho patterns by the introduction of a new "freezing" step to this process. This step involves covering the first litho pattern with chemical freezing materials to prevent damage by the second litho pattern creating a dual-line process composed of litho-"freezing"-litho-etch processes. In this paper, the details of dual-line process including a "freezing" step are explained and sub-40nm half-pitch litho patterns by this process are shown.

Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230H (26 March 2008); doi: 10.1117/12.772403
Show Author Affiliations
Masafumi Hori, JSR Corp. (Japan)
Tomoki Nagai, JSR Corp. (Japan)
Atsushi Nakamura, JSR Corp. (Japan)
Takayoshi Abe, JSR Corp. (Japan)
Gouji Wakamatsu, JSR Corp. (Japan)
Tomohiro Kakizawa, JSR Corp. (Japan)
Yuusuke Anno, JSR Corp. (Japan)
Makoto Sugiura, JSR Corp. (Japan)
Shiro Kusumoto, JSR Corp. (Japan)
Yoshikazu Yamaguchi, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)

Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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