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Proceedings Paper

Real-world impacts of inverse lithography technology
Author(s): Jonathan Ho; Yan Wang; Xin Wu; Wolfgang Leitermann; Benjamin Lin; Ming Feng Shieh; Jie-wei Sun; Orson Lin; Jason Lin; Yong Liu; Linyong Pang
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Paper Abstract

In this paper we describe, from the user's point of view, how Inverse Lithography Technology (ILT) differs from Optical Proximity Correction (OPC). We show simulation and experimental results from 90nm and 65nm semiconductor nodes, comparing ILT-generated masks and OPC-generated masks for real-life layouts, in a production environment. In addition, we discuss issues related to complexity and manufacturability of ILT-generated masks.

Paper Details

Date Published: 5 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921Z (5 November 2005); doi: 10.1117/12.632211
Show Author Affiliations
Jonathan Ho, Xilinx Inc. (United States)
Yan Wang, Xilinx Inc. (United States)
Xin Wu, Xilinx Inc. (United States)
Wolfgang Leitermann, Xilinx Inc. (United States)
Benjamin Lin, United Microelectronics Corp. (Taiwan)
Ming Feng Shieh, United Microelectronics Corp. (Taiwan)
Jie-wei Sun, United Microelectronics Corp. (Taiwan)
Orson Lin, Toppan Changhwa Electronics Co., Ltd. (Taiwan)
Jason Lin, Toppan Changhwa Electronics Co., Ltd. (Taiwan)
Yong Liu, Luminescent Technologies, Inc. (United States)
Linyong Pang, Luminescent Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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