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Proceedings Paper

Development of a figure correction method having spatial resolution close to 0.1 mm
Author(s): Yuzo Mori; Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Akira Saito; Katsuyoshi Endo; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa
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Paper Abstract

A new figure correction method is applied to fabricate an elliptical mirror to realize a one-dimensionally diverging X-ray beam having high image quality. Mutual relations between figure errors and intensity uniformities of diverging X-ray beams are also investigated using a wave-optical simulator and indicate that figure errors in relatively short spatial wavelength ranges lead to high-contrast interference fringes. By using the microstitching interferometer and elastic emission machining, figure correction of an elliptical mirror with lateral resolution close to 0.1mm was carried out. A one-dimensional diverging X-ray obtained by the fabricated mirror was observed at SPring-8 and evaluated to have a sufficiently flat intensity distribution.

Paper Details

Date Published: 13 January 2004
PDF: 7 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.520825
Show Author Affiliations
Yuzo Mori, Osaka Univ. (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Akira Saito, Osaka Univ. (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Alexei Souvorov, SPring-8/Japan Syschrotron Radiation Research Institute (Japan)
Makina Yabashi, SPring-8/Japan Syschrotron Radiation Research Institute (Japan)
Kenji Tamasaku, Spring-8/RIKEN (Japan)
Tetsuya Ishikawa, Spring-8/RIKEN (Japan)

Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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