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Proceedings Paper

Si microchannel plates for image intensification
Author(s): Arlynn W. Smith; Charles P. Beetz Jr.; Robert W. Boerstler; D. R. Winn; John W. Steinbeck
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Paper Abstract

Glass microchannel plates (MCPs) have been in use by numerous manufactuers in a variety of electron multiplication applications. Conventional fabrication of MCPs follow the lines of glass drawing and etching technology. Core and clad glass are drawn together, stacked, drawn again, and finally stacked in the desired pattern. The soluble core is removed with wet chemical processing. These techniques are beginning to run into their feasible limits in terms of channel size, open area ratio, uniformity, and material issues. A strong desire exists to fabricate MCPs with accepted lithographic techniques using Si as the base material to improve uniformity and throughput. Open area ratios of as high as 95% have been achieved using lithography. However, attempts to meet other channel plate characteristics met with little success due to thermal runaway or arcing during operation, high voltage is required for electron gain. Processing improvements have lead to the complete oxidation of the Si matrix eliminating the conducting Si in the channel walls of the Si MCPs allowing high voltages to be supported. Complete oxidation of the Si to silica allows processing temperatures high than conventional glass matrices can withstand. This fact allows for high temperature growth of conductive and secondary emissive materials on the channel walls of the structure. Si MCPs with gain have now been fabricated and tested with voltages comparable to conventional glass MCPs. Channel plate characteristics such as operating voltage, strip current, and gain for Si MCPs will be presented and compared to glass MCPs.

Paper Details

Date Published: 3 November 2000
PDF: 9 pages
Proc. SPIE 4128, Image Intensifiers and Applications II, (3 November 2000); doi: 10.1117/12.405877
Show Author Affiliations
Arlynn W. Smith, ITT Industries Night Vision (United States)
Charles P. Beetz Jr., Nanoscience Inc. (United States)
Robert W. Boerstler, Nanoscience Inc. (United States)
D. R. Winn, Nanoscience Inc. (United States)
John W. Steinbeck, Nanoscience Inc. (United States)

Published in SPIE Proceedings Vol. 4128:
Image Intensifiers and Applications II
C. Bruce Johnson, Editor(s)

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