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Proceedings Paper

Kissing corner handling in advanced nodes
Author(s): Harold Mendoza; Gazi Huda
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Paper Abstract

In the advanced nodes, abutted corners often referred to as kissing corners, are not physically printable using single layer photolithography techniques. In order to mitigate any downstream impact, the authors propose specific kissing corner handling methodologies in Mask Data Prep (MDP). In the layout, beveling is a method that can add or subtract shapes to either allow a resist feature to remain or space to resolve. Unlike functional active areas, Fill kissing corners can be proactively avoided by a correct-by-construction approach. Both these methodologies yield faster processing while improving the results without necessitating any design rule change.

Paper Details

Date Published: 23 March 2020
PDF: 10 pages
Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 1132819 (23 March 2020); doi: 10.1117/12.2551698
Show Author Affiliations
Harold Mendoza, GLOBALFOUNDRIES Inc. (United States)
Gazi Huda, Mentor, a Siemens Business (United States)


Published in SPIE Proceedings Vol. 11328:
Design-Process-Technology Co-optimization for Manufacturability XIV
Chi-Min Yuan, Editor(s)

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