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Proceedings Paper

Design and fabrication of UVLED array aligner for proximity and soft contact exposure
Author(s): Jiun-Woei Huang
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Paper Abstract

UVLED array aligner for proximity and soft contact exposure has been designed and fabricated. The source is designed for a lithography aligner, each UVLED is arranged in a plate with equal space to form UVLED array source. With AAAAS illumination optics, the aligner is built and has provided the uniformly source. 12 inches wafer with 0.6 micron mask for TSV process has proved in soft contact and proximity exposure modes, with less 1 microns for soft contact. 20 microns for 100 microns proximity exposure, with deviation of 1 micron.

Paper Details

Date Published: 23 March 2020
PDF: 11 pages
Proc. SPIE 11327, Optical Microlithography XXXIII, 113270Z (23 March 2020); doi: 10.1117/12.2551568
Show Author Affiliations
Jiun-Woei Huang, Taiwan Instrument Research Institute (Taiwan)
National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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