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EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility
Author(s): Herman Bekman; Michael Dekker; Rob Ebeling; Jochem Janssen; Norbert Koster; Joop Meijlink; Freek Molkenboer; Kyri Nicolai; Michel van Putten; Corné Rijnsent; Arnold Storm; Jetske Stortelder; Chien-Ching Wu; Rory de Zanger
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Paper Abstract

Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and installed at TNO, in close cooperation with Carl Zeiss. There was a desire to improve on the performance of EBL1 in terms of source power and intensity, and in handling of full size EUV photomasks. For this purpose TNO has invested in the realization of a second EUV Beam Line: EBL2. EBL2 makes use of a tin fueled (USHIO) source in order to have a similar pulse length, shape and spectrum as an EUV scanner of ASML. Samples can be exposed to various doses/intensities of EUV light. Various process gasses can be introduced in a broad range of partial pressures and also sample temperature can be controlled. In-situ ellipsometry and in-situ X-ray Photoelectric Spectroscopy (XPS) is available to track surface changes/modifications. In this presentation we will discuss the capabilities of this unique research facility which is open for external customers studying the influence of EUV radiation on mirrors, sensors, fiducials, pellicles and EUV photomasks. We will discuss in this presentation parts of the validation studies and the experience we gained over the past year by running the setup for external customers.

Paper Details

Date Published: 26 September 2019
PDF: 13 pages
Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 1114706 (26 September 2019); doi: 10.1117/12.2536531
Show Author Affiliations
Herman Bekman, TNO Science and Industry (Netherlands)
Michael Dekker, TNO Science and Industry (Netherlands)
Rob Ebeling, TNO Science and Industry (Netherlands)
Jochem Janssen, TNO Science and Industry (Netherlands)
Norbert Koster, TNO Science and Industry (Netherlands)
Joop Meijlink, TNO Science and Industry (Netherlands)
Freek Molkenboer, TNO Science and Industry (Netherlands)
Kyri Nicolai, TNO Science and Industry (Netherlands)
Michel van Putten, TNO Science and Industry (Netherlands)
Corné Rijnsent, TNO Science and Industry (Netherlands)
Arnold Storm, TNO Science and Industry (Netherlands)
Jetske Stortelder, TNO Science and Industry (Netherlands)
Chien-Ching Wu, TNO Science and Industry (Netherlands)
Rory de Zanger, TNO Science and Industry (Netherlands)


Published in SPIE Proceedings Vol. 11147:
International Conference on Extreme Ultraviolet Lithography 2019
Toshiro Itani; Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse, Editor(s)

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