Proceedings Paper
High energy excimer laser system for nanosecond annealing of semiconductor devices| Format | Member Price | Non-Member Price |
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Paper Abstract
We present a high energy UV, 308 nm Xenon-Chloride excimer laser system providing a precisely controlled ultra-fast (nanosecond scale) thermal processing of semiconductor devices. The main elements of the system are described and key performance indicators are presented.
Paper Details
Date Published: 3 January 2019
PDF: 6 pages
Proc. SPIE 11042, XXII International Symposium on High Power Laser Systems and Applications, 110420S (3 January 2019); doi: 10.1117/12.2522443
Published in SPIE Proceedings Vol. 11042:
XXII International Symposium on High Power Laser Systems and Applications
Paolo Di Lazzaro, Editor(s)
PDF: 6 pages
Proc. SPIE 11042, XXII International Symposium on High Power Laser Systems and Applications, 110420S (3 January 2019); doi: 10.1117/12.2522443
Show Author Affiliations
Hervé Besaucèle, Laser Systems and Solutions of Europe (France)
Audrey Adnet, Laser Systems and Solutions of Europe (France)
François Beau, Laser Systems and Solutions of Europe (France)
Yacine Bouksou, Laser Systems and Solutions of Europe (France)
Cédric Bellier, Laser Systems and Solutions of Europe (France)
Paul Ceccato, Laser Systems and Solutions of Europe (France)
Maxime Chatelain, Laser Systems and Solutions of Europe (France)
Nabil Douri, Laser Systems and Solutions of Europe (France)
Hervé Dusserre, Laser Systems and Solutions of Europe (France)
Cyril Dutems, Laser Systems and Solutions of Europe (France)
Martin Heintzmann, Laser Systems and Solutions of Europe (France)
Karim Huet, Laser Systems and Solutions of Europe (France)
Mathieu Lenormand, Laser Systems and Solutions of Europe (France)
Audrey Adnet, Laser Systems and Solutions of Europe (France)
François Beau, Laser Systems and Solutions of Europe (France)
Yacine Bouksou, Laser Systems and Solutions of Europe (France)
Cédric Bellier, Laser Systems and Solutions of Europe (France)
Paul Ceccato, Laser Systems and Solutions of Europe (France)
Maxime Chatelain, Laser Systems and Solutions of Europe (France)
Nabil Douri, Laser Systems and Solutions of Europe (France)
Hervé Dusserre, Laser Systems and Solutions of Europe (France)
Cyril Dutems, Laser Systems and Solutions of Europe (France)
Martin Heintzmann, Laser Systems and Solutions of Europe (France)
Karim Huet, Laser Systems and Solutions of Europe (France)
Mathieu Lenormand, Laser Systems and Solutions of Europe (France)
Bobby Lespinasse, Laser Systems and Solutions of Europe (France)
Vincent Martinez, Laser Systems and Solutions of Europe (France)
Fulvio Mazzamuto, Laser Systems and Solutions of Europe (France)
Antoine Melin, Laser Systems and Solutions of Europe (France)
Sylvain Perrot, Laser Systems and Solutions of Europe (France)
David Rodrigues, Laser Systems and Solutions of Europe (France)
Laurent Ruet, Laser Systems and Solutions of Europe (France)
Olivier Sannier, Laser Systems and Solutions of Europe (France)
Guillaume Thebault, Laser Systems and Solutions of Europe (France)
Inès Toqué-Tresonne, Laser Systems and Solutions of Europe (France)
Armand Vestraete, Laser Systems and Solutions of Europe (France)
Karim Zekri, Laser Systems and Solutions of Europe (France)
Vincent Martinez, Laser Systems and Solutions of Europe (France)
Fulvio Mazzamuto, Laser Systems and Solutions of Europe (France)
Antoine Melin, Laser Systems and Solutions of Europe (France)
Sylvain Perrot, Laser Systems and Solutions of Europe (France)
David Rodrigues, Laser Systems and Solutions of Europe (France)
Laurent Ruet, Laser Systems and Solutions of Europe (France)
Olivier Sannier, Laser Systems and Solutions of Europe (France)
Guillaume Thebault, Laser Systems and Solutions of Europe (France)
Inès Toqué-Tresonne, Laser Systems and Solutions of Europe (France)
Armand Vestraete, Laser Systems and Solutions of Europe (France)
Karim Zekri, Laser Systems and Solutions of Europe (France)
Published in SPIE Proceedings Vol. 11042:
XXII International Symposium on High Power Laser Systems and Applications
Paolo Di Lazzaro, Editor(s)
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