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Proceedings Paper

Development of a particle-detection system for phase-shifting masks
Author(s): Hiroaki Shishido; Shunichi Matsumoto; Yukio Kenbo; Morihisa Hoga; Yasuhiro Koizumi
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Paper Abstract

Particles as small as 0.34 micrometers are detected on phase-shifting masks for 0.3 micrometer LSIs by the particle detection system PS-6000. The system detects the forward- scattered light from the particles using illumination through the rear surface of the masks.

Paper Details

Date Published: 7 June 1996
PDF: 11 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240920
Show Author Affiliations
Hiroaki Shishido, Hitachi, Ltd. (Japan)
Shunichi Matsumoto, Hitachi, Ltd. (Japan)
Yukio Kenbo, Hitachi, Ltd. (Japan)
Morihisa Hoga, Hitachi, Ltd. (Japan)
Yasuhiro Koizumi, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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