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Proceedings Paper

Optimization technique of wavefront coding system based on ZEMAX externally compiled programs
Author(s): Libo Han; Liquan Dong; Ming Liu; Yuejin Zhao; Xiaohua Liu
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Paper Abstract

Wavefront coding technique as a means of athermalization applied to infrared imaging system, the design of phase plate is the key to system performance. This paper apply the externally compiled programs of ZEMAX to the optimization of phase mask in the normal optical design process, namely defining the evaluation function of wavefront coding system based on the consistency of modulation transfer function (MTF) and improving the speed of optimization by means of the introduction of the mathematical software. User write an external program which computes the evaluation function on account of the powerful computing feature of the mathematical software in order to find the optimal parameters of phase mask, and accelerate convergence through generic algorithm (GA), then use dynamic data exchange (DDE) interface between ZEMAX and mathematical software to realize high-speed data exchanging. The optimization of the rotational symmetric phase mask and the cubic phase mask have been completed by this method, the depth of focus increases nearly 3 times by inserting the rotational symmetric phase mask, while the other system with cubic phase mask can be increased to 10 times, the consistency of MTF decrease obviously, the maximum operating temperature of optimized system range between -40℃-60℃. Results show that this optimization method can be more convenient to define some unconventional optimization goals and fleetly to optimize optical system with special properties due to its externally compiled function and DDE, there will be greater significance for the optimization of unconventional optical system.

Paper Details

Date Published: 31 October 2016
PDF: 10 pages
Proc. SPIE 10021, Optical Design and Testing VII, 1002113 (31 October 2016); doi: 10.1117/12.2245380
Show Author Affiliations
Libo Han, Beijing Institute of Technology (China)
Liquan Dong, Beijing Institute of Technology (China)
Ming Liu, Beijing Institute of Technology (China)
Yuejin Zhao, Beijing Institute of Technology (China)
Xiaohua Liu, Beijing Institute of Technology (China)

Published in SPIE Proceedings Vol. 10021:
Optical Design and Testing VII
Yongtian Wang; Tina E. Kidger; Kimio Tatsuno, Editor(s)

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