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Proceedings Paper

Lithography aware overlay metrology target design method
Author(s): Myungjun Lee; Mark D. Smith; Joonseuk Lee; Mirim Jung; Honggoo Lee; Youngsik Kim; Sangjun Han; Michael E. Adel; Kangsan Lee; Dohwa Lee; Dongsub Choi; Zephyr Liu; Tal Itzkovich; Vladimir Levinski; Ady Levy
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Paper Abstract

We present a metrology target design (MTD) framework based on co-optimizing lithography and metrology performance. The overlay metrology performance is strongly related to the target design and optimizing the target under different process variations in a high NA optical lithography tool and measurement conditions in a metrology tool becomes critical for sub-20nm nodes. The lithography performance can be quantified by device matching and printability metrics, while accuracy and precision metrics are used to quantify the metrology performance. Based on using these metrics, we demonstrate how the optimized target can improve target printability while maintaining the good metrology performance for rotated dipole illumination used for printing a sub-100nm diagonal feature in a memory active layer. The remaining challenges and the existing tradeoff between metrology and lithography performance are explored with the metrology target designer’s perspective. The proposed target design framework is completely general and can be used to optimize targets for different lithography conditions. The results from our analysis are both physically sensible and in good agreement with experimental results.

Paper Details

Date Published: 24 March 2016
PDF: 14 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781L (24 March 2016); doi: 10.1117/12.2218653
Show Author Affiliations
Myungjun Lee, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)
Joonseuk Lee, SK Hynix (Korea, Republic of)
Mirim Jung, SK Hynix (Korea, Republic of)
Honggoo Lee, SK Hynix (Korea, Republic of)
Youngsik Kim, SK Hynix (Korea, Republic of)
Sangjun Han, SK Hynix (Korea, Republic of)
Michael E. Adel, KLA-Tencor Israel (Israel)
Kangsan Lee, KLA-Tencor Korea (Korea, Republic of)
Dohwa Lee, KLA-Tencor Korea (Korea, Republic of)
Dongsub Choi, KLA-Tencor Korea (Korea, Republic of)
Zephyr Liu, KLA-Tencor Korea (Korea, Republic of)
Tal Itzkovich, KLA-Tencor Israel (Israel)
Vladimir Levinski, KLA-Tencor Israel (Israel)
Ady Levy, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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