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PROCEEDINGS VOLUME 9256

Photomask and Next-Generation Lithography Mask Technology XXI
Editor(s): Kokoro Kato
Format Member Price Non-Member Price
Softcover $60.00 $80.00

Volume Details

Volume Number: 9256
Date Published: 28 July 2014
Softcover: 32 papers (278) pages
ISBN: 9781628413236

Table of Contents
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Front Matter: Volume 9256
Author(s): Proceedings of SPIE
Three dimensional profile measurement using multi-channel detector MVM-SEM
Author(s): Makoto Yoshikawa; Sumito Harada; Keisuke Ito; Tsutomu Murakawa; Soichi Shida; Jun Matsumoto; Takayuki Nakamura
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Two new design methods for lithography mask: phase-shifting scattering bar and interlaced phase-shifting mask
Author(s): Kwei-Tin Yeh; Chao-Yi Huang
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Demands for Masks in 1.5μm Generation
Author(s): Nozomu Izumi; Miwako Ando; Yoshiyuki Nagai; Nobuhiko Yabu
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EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Author(s): Hidekazu Takekoshi; Takahito Nakayama; Kenichi Saito; Hiroyoshi Ando; Hideo Inoue; Noriaki Nakayamada; Takashi Kamikubo; Rieko Nishimura; Yoshinori Kojima; Jun Yashima; Akihito Anpo; Seiichi Nakazawa; Tomohiro Iijima; Kenji Ohtoshi; Hirohito Anze; Victor Katsap; Steven Golladay; Rodney Kendall
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Built-in lens mask lithography: challenge for high definition lens-less lithography
Author(s): Naoki Ueda; Masaru Sasago; Akio Misaka; Hisao Kikuta; Hiroaki Kawata; Yoshihiko Hirai
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Study of hotspot repair using cellular automata method
Author(s): Norimasa Nagase; Kanji Takeuchi; Mitsuo Sakurai; Takahisa Itoh; Tomoyuki Okada
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EUV mask process specifics and development challenges
Author(s): Pavel Nesladek
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Performance in practical use of actinic EUVL mask blank inspection
Author(s): Takeshi Yamane; Yongdae Kim; Noriaki Takagi; Tsuneo Terasawa; Tomohisa Ino; Tomohiro Suzuki; Hiroki Miyai; Kiwamu Takehisa; Haruhiko Kusunose
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Simulation of image placement error due to fabrication of black border on EUV mask
Author(s): Yasushi Nishiyama; Shinpei Kondo; Norihito Fukugami
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Use of ILT-based mask optimization for local printability enhancement
Author(s): Alexander Tritchkov; Sergey Kobelkov; Sergei Rodin; Kyohei Sakajiri; Evgueni Egorov; Soung-Su Woo
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Defect analysis on actinic blank inspection tool
Author(s): Tomohiro Suzuki; Hiroki Miyai; Kiwamu Takehisa; Haruhiko Kusunose; Takeshi Yamane; Hidehiro Watanabe; Ichiro Mori
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Novel CD-SEM measurement methodology for complex OPCed patterns
Author(s): Hyung-Joo Lee; Won Joo Park; Seuk Hwan Choi; Dong Hoon Chung; Inkyun Shin; Byung-Gook Kim; Chan-Uk Jeon; Hiroshi Fukaya; Yoshiaki Ogiso; Soichi Shida; Takayuki Nakamura
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Etched multilayer mask in EUV lithography for 16 nm node and below
Author(s): Guk-Jin Kim; Michael Yeung; Eytan Barouch; Hye-Keun Oh
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High performance mask fabrication process for the next-generation mask production
Author(s): Keisuke Yagawa; Kunihiro Ugajin; Machiko Suenaga; Yoshihito Kobayashi; Takeharu Motokawa; Kazuki Hagihara; Masato Saito; Masamitsu Itoh
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EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond
Author(s): Ryoichi Hirano; Susumu Iida; Tsuyoshi Amano; Tsueno Terasawa; Hidehiro Watanabe; Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao
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Challenges and technical requirements for multi-beam mask writer development
Author(s): Sang Hee Lee; Jin Choi; Ho June Lee; In Kyun Shin; Shuichi Tamamushi; Chan-Uk Jeon
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Etched multilayer mask is better than conventional absorber mask
Author(s): Guk-Jin Kim; Hye-Keun Oh; In-Seon Kim; Michael Yeung; Eytan Barouch
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Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation
Author(s): Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao; Kenji Watanabe; Yasushi Tohma; Tsuyoshi Amano; Ryoichi Hirano; Susumu Iida; Tsuneo Terasawa; Hidehiro Watanabe
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Accurate mask model for advanced nodes
Author(s): Nacer Zine El Abidine; Frank Sundermann; Emek Yesilada; El Hadji Omar Ndiaye; Kushlendra Mishra; Sankaranarayanan Paninjath; Ingo Bork; Peter Buck; Olivier Toublan; Isabelle Schanen
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Ruthenium (Ru) peeling and predicting robustness of the capping layer using finite element method (FEM) modeling
Author(s): Il-Yong Jang; Arun John; Frank Goodwin; Su-Young Lee; Byung-Gook Kim; Seong-Sue Kim; Chan-Uk Jeon; Jae Hyung Kim; Yong Hoon Jang
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Application of EB repair for high durable MoSi PSM
Author(s): Shingo Kanamitsu; Keiko Morishita; Takashi Hirano
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Evaluation of AIMS D2DB simulation without calibration images
Author(s): Masaharu Nishiguchi; Kouichi Kanno; Katsuya Hayano; Hideyoshi Takamizawa; Kana Ohara; Donghwan Son; Vikram Tolani
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Towards reduced impact of EUV mask defectivity on wafer
Author(s): R. Jonckheere; D. Van den Heuvel; A. Pacco; I. Pollentier; B. Baudemprez; C. Jehoul; J. Hermans; E. Hendrickx
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Study of the mask materials for PTD process and NTD process in practical ArF immersion lithography
Author(s): Takashi Adachi; Ayako Tani; Katsuya Hayano; Hideyoshi Takamizawa
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Screening EUV mask absorbers for defect repair
Author(s): Takeshi Isogawa; Kazunori Seki; Mark Lawliss; Emily Gallagher; Shinji Akima; Toshio Konishi
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Extreme ultraviolet mask roughness: requirements, characterization, and modeling
Author(s): Patrick Naulleau; Suchit Bhattaria; Rick Chao; Rene Claus; Kenneth Goldberg; Frank Goodwin; Eric Gullikson; Donggun Lee; Andy Neureuther; Jong-Ju Park
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In-die registration measurement using novel model-based approach for advanced technology masks
Author(s): Shunsuke Sato; Frank Laske; Shinji Kunitani; Tatsuhiko Kamibayashi; Akira Fuse; Naoki Takahashi; Klaus-Dieter Roeth; Slawomir Czerkas; Mehdi Daneshpanah; Yoshinori Nagaoka
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Efficient ozone, sulfate, and ammonium free resist stripping process
Author(s): Davide Dattilo; Uwe Dietze
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Characterization of decay component of resist surface charging on EBM-8000
Author(s): Noriaki Nakayamada; Takashi Kamikubo; Hirohito Anze; Muheniro Ogasawara
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Learning from native defects on EUV mask blanks
Author(s): Emily Gallagher; Alfred Wagner; Mark Lawliss; Gregory McIntyre; Kazunori Seki; Takeshi Isogawa; Steven Nash
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Proximity corrected accurate in-die registration metrology
Author(s): M. Daneshpanah; F. Laske; M. Wagner; K.-D. Roeth; S. Czerkas; H. Yamaguchi; N. Fujii; S. Yoshikawa; K. Kanno; H. Takamizawa
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Achievements and challenges of EUV mask imaging
Author(s): Natalia Davydova; Eelco van Setten; Robert de Kruif; Brid Connolly; Norihito Fukugami; Yutaka Kodera; Hiroaki Morimoto; Yo Sakata; Jun Kotani; Shinpei Kondo; Tomohiro Imoto; Haiko Rolff; Albrecht Ullrich; Ad Lammers; Guido Schiffelers; Joep van Dijk
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