Mark your calendar for 2021 This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences.
We look forward to the 2021 event.
Mark your calendar 26 - 30 September 2021
2021 Call for Papers available by January
Call for Papers coming soon
Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
Photomask Technology
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Design automation and data prep (DFM, OPC, SMO)
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Mask write, corrections, process compensation (MPC)
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Mask blanks, defects and metrology (materials, process, control)
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Mask process (resist, devlop, etch, cleans)
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Metrology (CD, placement, AFM, AIMS)
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Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
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Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
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Nanoimprint lithography tools, mask, transfer, and resists
