Print PageEmail Page

    Photomask Technology + Extreme Ultraviolet Lithography 2021

    Get the latest information on SPIE Photomask Technology + EUV Lithography

    Mark your calendar for 2021
    This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences.

    We look forward to the 2021 event.

    Mark your calendar
    26 - 30 September 2021

    2021 Call for Papers
    available by January

    Call for Papers coming soon

    Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

    Photomask Technology Extreme Ultraviolet Lithography
    Photomask Technology
    Design automation and data prep (DFM, OPC, SMO)
    Mask write, corrections, process compensation (MPC)
    Mask blanks, defects and metrology (materials, process, control)
    Mask process (resist, devlop, etch, cleans)
    Metrology (CD, placement, AFM, AIMS)
    Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
    Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
    Nanoimprint lithography tools, mask, transfer, and resists
    Deep learning mask technology applications
    Extreme Ultraviolet Lithography
    EUV readiness and insertion in manufacturing
    EUV tools, including sources and optics
    EUV mask metrology, inspection and lifetime
    EUV mask and imaging
    EUV mask pellicles
    EUV resist materials/process and contamination
    EUV process control and stochastics
    EUV patterning and process enhancement
    EUV lithography extendibility
    Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

    Connect with SPIE

                      #SPIEPhotomaskEUV FB Twitter Check out SPIE on Instagram YouTube LinkedIn

    Receive email updates about SPIE Photomask Technology + EUVL

    Beautiful, free images to use as a backdrop for zoom or social media