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    Photomask 2018 Awards

    2018 Best Student Paper Award generously sponsored by Photronics Inc.

    Established to encourage students working in fields related to photomasks. This award is open to students presenting oral papers in either the Photomask or the EUV Lithography conference.

    To be considered:
    • The student must be the presenting author.
    • The students must identify themselves as a student during the abstract submission.
    • The student must be the lead manuscript author and submit their manuscript by 22 August 2018.
    • After abstract submission, the student must send an email providing the abstract tracking number, and attaching a 2-page extended abstract.

    Please email to conference chairs:

    Four finalists will be notified by email and receive $500 for travel. These finalists will present at the conference where their contributions will be evaluated for the overall award and an additional $500 based on the innovation and style of both the oral presentation and the submitted manuscript publication, and the importance of the work to the photomask industry.

    Awards Sponsored by


    2018 Best Student Poster Award generously sponsored by ZEISS

    The ZEISS Award for Talents in the Industry was established to support students working in the fields of photomask and EUV lithography.

    To be considered:

    • The Student must be the presenting author of the poster. They must attend the conference and be present at their poster during the poster session.
    • The student must identify themselves as a student during the abstract submission.
    • The Student must be the lead manuscript author and submit their mansucrpt by 22 August 2018.

    The SPIE Photomask + EUV Lithography symposium student posters will be assessed by an award committee consisting of members of the program committee from both conferences. Contributions will be judged for technical merit of the poster, relevance of the topic to the industry and the author’s ability to explain the work. Winners will be awarded a ZEISS certificate, a trophy, and a monetary prize: $1000 for 1st place, $500 each for 2nd and 3rd places.

    Awards Sponsored by


    Abstracts due
    31 May 2021

    Author notification
    15 July 2021

    Manuscripts Due
    25 August 2021


    ZEISS generously sponsored the Award for Talents in the field of EUV lithography.
    Learn more about ZEISS


    Photronics is the proud sponsor of the Photronics Student Award.
    Learn more about Photronics

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