Takayuki Uchiyama

Director, Lithography
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Profile Summary

Research and development of lithography for semiconductor
Experience includes the production engineering of Lithography process and the development of i-line, KrF, ArF, ArF immersion, EB, EUV lithography at IDM (Integrated Device Manufacturer)
The chairman of lithography team in Japan of ITRS from 2009 to 2012.
A pioneer in terms of ArF immersion lithography and SMO (source mask co-optimization)

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