Paul DePesa

Retired
DePesa, Paul
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SPIE Membership: 11.0 years
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Publications

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SPIE Conference Proceeding | December 27, 2002
Paul DePesa; Danny Keogan
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Computed tomography, Optical proximity correction, Operating systems, Databases, Data processing, Sun, Photomasks, Beam shaping, Analytical research, Beam analyzers
SPIE Conference Proceeding | August 1, 2002
Paul DePesa; Danny Keogan
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Computed tomography, Databases, Photomasks, Optical proximity correction, Data processing, Resolution enhancement technologies, Beam shaping, Vestigial sideband modulation, Logic, Computer aided design
SPIE Conference Proceeding | January 22, 2001
Charles Howard, Paul DePesa, et al.
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Optical proximity correction, Databases, Computed tomography, Standards development, Binary data, Lithography
SPIE Conference Proceeding | January 22, 2001
Paul DePesa; Wolfgang Leitermann
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Computed tomography, Databases, Photomasks, Manufacturing, Windows NT, Sun, Optical proximity correction, Logic, Array processing, Photomask technology
SPIE Conference Proceeding | December 7, 1994
Rudolf von Buenau, Ricardo Diola, et al.
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Photomasks, Reflectivity, Photomask technology, Photoresist materials, Aluminum, Thin films, Head, Opacity, Solids, Lithography
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