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SPIE Conference Proceeding | June 28, 2013 Kokoro Kato, Yoshiyuki Taniguchi, et al. Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Fuzzy logic, Data processing, Mirrors, Semiconducting wafers, Electronic design automation, Critical dimension metrology, Nanotechnology SPIE Conference Proceeding | May 19, 2008 Kokoro Kato, Yoshiyuki Taniguchi, et al. Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV KEYWORDS: Photomasks, Data conversion, Optical proximity correction, Parallel processing, Nanotechnology, Data modeling, Standards development, Data processing, Error analysis, Explosives SPIE Conference Proceeding | November 1, 2007 Kokoro Kato, Yoshiyuki Taniguchi, et al. Proc. SPIE. 6730, Photomask Technology 2007 KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis SPIE Conference Proceeding | May 15, 2007 Masakazu Endo, Yoshiyuki Taniguchi, et al. Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV KEYWORDS: Data conversion, Photomasks, Data analysis, Error analysis, Standards development, Electronic design automation, Nanotechnology, Data processing, Data compression SPIE Conference Proceeding | May 20, 2006 Kokoro Kato, Kuninori Nishizawa, et al. Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing |