Kuninori Nishizawa

Hitachi High-Tech Science Corp
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SPIE Conference Proceeding | June 28, 2013
Kokoro Kato, Yoshiyuki Taniguchi, et al.
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Fuzzy logic, Data processing, Mirrors, Semiconducting wafers, Electronic design automation, Critical dimension metrology, Nanotechnology
SPIE Conference Proceeding | May 19, 2008
Kokoro Kato, Yoshiyuki Taniguchi, et al.
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Data conversion, Optical proximity correction, Parallel processing, Nanotechnology, Data modeling, Standards development, Data processing, Error analysis, Explosives
SPIE Conference Proceeding | November 1, 2007
Kokoro Kato, Yoshiyuki Taniguchi, et al.
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis
SPIE Conference Proceeding | May 15, 2007
Masakazu Endo, Yoshiyuki Taniguchi, et al.
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Data conversion, Photomasks, Data analysis, Error analysis, Standards development, Electronic design automation, Nanotechnology, Data processing, Data compression
SPIE Conference Proceeding | May 20, 2006
Kokoro Kato, Kuninori Nishizawa, et al.
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing
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