Jack Chen

Jack Chen found NanoPatterning Technology Co., Ltd for consulting service. He launched the “Massively E-Beam Direct Write Academia-Industry Alliance” based on Mapper technology with Distinguished Prof. Burn Lin and Prof Po-Wen Chiu in NTHU since summer 2017, but the project was terminated in Jan 2019. He resigned from TSMC, where he was the department manager of RD Litho after 21-year work, and became a freelancer in 2016. He joined TSMC in 1995 right after he received the master’s degree in physics from NTU, and since then continuously focused on the new generation lithography development with full spectrum from 365nm, to 248nm, 193nm, and then 193nm immersion, multiple e-beam, and EUV, under the litho guru Dr. Burn Lin. He was assigned to Holland between 2005-2007 to jointly develop the 193nm immersion and EUV technology with ASML, and participated the IMEC consortium in Belgium. In 2007, he was called back to start the MEBDW program and later join the EUV program. In these projects, he formed and led the team in the company, with brainstorming to file more than 100 patents, and with speeches to drive the industry to develop the technologies fulfilling TSMC’s requirements and realize the new generation lithography in production.