Dr. Hidetoshi Morokuma

Sales Representative at Hitachi High-Tech America Inc
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Publications

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SPIE Conference Proceeding | April 5, 2007
Benjamin Bunday, John Allgair, et al.
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Pattern recognition, Critical dimension metrology, Metrology, Optical proximity correction, Semiconducting wafers, Reticles, Inspection, Scanning electron microscopy, Yield improvement, Detection and tracking algorithms
SPIE Conference Proceeding | March 27, 2007
Cyrus Tabery, Hidetoshi Morokuma, et al.
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Calibration, Scanning electron microscopy, Optical proximity correction, Data modeling, Image processing, Edge detection, Process modeling, Metrology, Critical dimension metrology, Image quality
SPIE Conference Proceeding | March 24, 2006
Benjamin Bunday, William Lipscomb, et al.
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Pattern recognition, Semiconducting wafers, Optical proximity correction, Scanning electron microscopy, Computer aided design, Lithography, Metrology, Scatterometry, Reticles, Precision measurement
SPIE Conference Proceeding | March 24, 2006
Cyrus Tabery, Hidetoshi Morokuma, et al.
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Scanning electron microscopy, Optical proximity correction, Image processing, Image quality, Edge detection, Calibration, Metrology, Lithography, Process modeling, Image analysis
SPIE Conference Proceeding | March 24, 2006
Ryoichi Matsuoka, Atsushi Miyamoto, et al.
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconducting wafers, Atrial fibrillation, Scanning electron microscopy, Pattern recognition, Semiconductors, Optical proximity correction, Image acquisition, Image processing, Electronic design automation, Data acquisition

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