Deep Panjwani

R & D Photo-Lithography Engineer at Micron Technology
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Area of Expertise: Lithography, Optics, Sensors, Plasmonics, Nano Particles, Infrared Coatings
Websites: Company Website
Social Media: LinkedIn
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Profile Summary

Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing. Micron Technology is a global leader in manufacturing of DRAM, NAND, NOR Flash memories and now extending its business in consumer products such as SSDs and USB Storage Drives (e.g. Crucial and Ballistix).

– Owning Front End of the Line (FEOL) critical modules for development of next generation NAND FLASH memory at R&D head quarter in Boise (FAB 4).
– Optimize cell yield improvements, failure analysis, and device performance through 365, 248 nm and state of the art immersion lithography techniques.
– Provide Process Integration Solutions & perform Statistical Analysis using Pandas Data Frame on Python. Perform Design of Experiments (DOE) and theoretical simulations (such as Monte Carlo) to predict potential yield in FLASH memory manufacturing.

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