Pulsed laser deposition systems and lasers for pilot and volume production
26 January 2022 • 2:40 PM - 3:00 PM PST | Room 208 (Level 2 South)
Pulsed laser deposition has evolved into a production technology for growing thin film materials with properties which are challenging to obtain by classical deposition methods such as sputtering or sol-gel deposition. Novel wafer based PLD system technology based on powerful excimer lasers allows universities, institutes and foundries to add 30+ new materials and material systems to their deposition portfolio enabling fabrication e.g. of electro-optical materials, transparent conductive oxides and perovskites. Dielectric, ferroelectric and piezoelectric material depositions can also be performed in any desirable sequence and can run with a single wafer load-lock, cassette handler or integrated with pre-clean station as part of the Solmates cluster platform. Deposition results obtained with the latest 300 mm wafer platform will be discussed.
Coherent LaserSystems GmbH & Co. KG (Germany)
Director of strategic marketing for the Flat Panel Display (FPD) market at Coherent. Over 20 years experience in general laser applications. Worked as product line manager for Coherent Excimer laser and FlexOLED LLO systems in Goettingen/Germany, since 2015 focused on laser based µLED applications.