36th European Mask and Lithography Conference (EMLC 2020)
Dates: 22-24 June 2020 Location: Leuven, Belgium
Submissions for EMLC 2020 will go through the SPIE Submission and Review System.
Submit Your Abstract
You will be asked to provide information about your submission, including complete author information.
An account is required to submit an abstract for this conference. You can create an account when you click on the link below, or if you already have an SPIE account, you can sign in:
Chairs and Committee Members: Access and review submissions.
Authors: Complete your submission, submit a revision, or view the status of your submission.
If you have questions about the submission process, please contact Jenny Woods, SPIE Proceedings Coordinator (jennyw@spie.org) or call +1 360 676 3290. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.
