Advances in X-Ray/EUV Optics and Components XIX

This conference focuses on the advances, challenges, emerging needs, and applications of x-ray and EUV sources, and related optics and instrumentation. The aim is to provide an opportunity for the developers and users of the systems to share the progress and challenges in each of these and related areas. Presentations on emerging needs, progress reports, and topical reviews covering the following and related topics are solicited:

• synchrotron X-ray / EUV and XFEL sources and facilities
• laboratory-based X-ray / EUV sources and applications
• diffractive, reflective, and refractive optics design, analysis, fabrication, and applications
• focusing optics developments and applications
• component implementation and integration into optical systems
• calibration, alignment, stability, and damage of optical elements
• adaptive optics and applications
• at wavelength and optical metrology techniques
• applications of machine learning and artificial intelligence in data analysis
• computational methods for X-ray optics.