This long standing and well-attended conference features interferometry and optical metrology techniques and applications. The techniques enable non-contact inspection of a wide range of objects from macro-scale to nano-scale, and surface finishes from super-polished to structured or randomly rough. Applications in research laboratories, industrial manufacturing, and standardization institutes that rely on the precision, reliability, and flexibility of these techniques steer the industry toward new horizons. For example, applications in new technologies such as MEMS/MOEMS, biomedical devices and light weighted segmented mirrors have pushed the field toward ever more challenging new solutions. These new developments have greatly impacted the science of optical measurements and instruments.

Authors with topics related to interferometry and optical metrology are encouraged to submit contributions to this conference. This conference is expected to receive 80-100 papers covering the latest advances in areas relating to techniques and applications of interferometry and fringe analysis methods. Recent progress and next-generation developments will be highlighted. Invited talks will be included with regular conference talks and poster presentations. The meeting will encompass 3-4 days and avoid parallel sessions. In addition, sufficient time will be allotted for visiting the poster sessions and exhibits.

Papers are solicited on the following and related topics: We will have a "Fringe Art" Competition: Bring your favorite fringe pattern to display.;
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Conference OP323

Interferometry XXI

This conference has an open call for papers:
Abstract Due: 9 February 2022
Author Notification: 18 April 2022
Manuscript Due: 27 July 2022
This long standing and well-attended conference features interferometry and optical metrology techniques and applications. The techniques enable non-contact inspection of a wide range of objects from macro-scale to nano-scale, and surface finishes from super-polished to structured or randomly rough. Applications in research laboratories, industrial manufacturing, and standardization institutes that rely on the precision, reliability, and flexibility of these techniques steer the industry toward new horizons. For example, applications in new technologies such as MEMS/MOEMS, biomedical devices and light weighted segmented mirrors have pushed the field toward ever more challenging new solutions. These new developments have greatly impacted the science of optical measurements and instruments.

Authors with topics related to interferometry and optical metrology are encouraged to submit contributions to this conference. This conference is expected to receive 80-100 papers covering the latest advances in areas relating to techniques and applications of interferometry and fringe analysis methods. Recent progress and next-generation developments will be highlighted. Invited talks will be included with regular conference talks and poster presentations. The meeting will encompass 3-4 days and avoid parallel sessions. In addition, sufficient time will be allotted for visiting the poster sessions and exhibits.

Papers are solicited on the following and related topics:
  • active and real-time measurement systems
  • atom interferometry
  • automotive, aerospace and other industrial applications
  • automated measurements
  • bio-interferometry to measure and image cells and tissues
  • biological and pharmaceutical applications
  • calibration and standardization methods
  • digital holography and speckle techniques
  • distance and shape measurements across multiple scales
  • dynamic process characterization
  • flats, sphere, and asphere testing
  • freeform, mid-spatial frequency, and roughness measurement
  • fringe analysis techniques
  • fringe projection and reflection methods
  • grating and grid (moiré) methods
  • gravitational wave interferometry
  • high-speed 3D metrology
  • integrated optical interferometry
  • intelligent metrology systems
  • interaction between modeling, simulation, and experiments
  • interferometric fiber optic sensors
  • materials, structural analysis, and testing
  • MEMS/MOEMS reliability analysis, assembly, and packaging testing
  • nano-metrology
  • nondestructive testing and failure analysis
  • optical projection tomography techniques
  • phase measurement techniques
  • polarization and geometric-phase techniques
  • semiconductor wafer inspection, photolithography mask metrology, and inspection
  • shearing interferometry and other gradient methods
  • stress and strain analysis
  • surface profiling
  • astronomical and adaptive optics through micro optics testing
  • terahertz techniques and applications
  • thin-film metrology
  • tunable wavelength, spectral interferometry and wavelength dependent methods
  • wavefront sensing techniques
  • white light interferometry and optical coherence tomography
  • x-ray and high energy optics characterization
  • to 1/∞ and beyond.
We will have a "Fringe Art" Competition: Bring your favorite fringe pattern to display.
Conference Chair
4D Technology Corp. (United States)
Conference Chair
Optineering (United States), The Univ. of Arizona (United States)
Conference Chair
The Univ. of North Carolina at Charlotte (United States)
Program Committee
Norwegian Univ. of Science and Technology (Norway)
Program Committee
Univ. Federal de Santa Catarina (Brazil)
Program Committee
Univ. de la República Uruguay (Uruguay)
Program Committee
Mahr (United States), Process Measurement Resources (United States)
Program Committee
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB (Germany)
Program Committee
Zygo Corporation (United States)
Program Committee
National Univ. of Ireland, Galway (Ireland)
Program Committee
The Univ. of North Carolina at Charlotte (United States)
Program Committee
Istituto di Scienze Applicate e Sistemi Intelligenti "Eduardo Caianiello" (Italy)
Program Committee
Liège Univ. (Belgium)
Program Committee
Nikon Research Corp. of America (United States)
Program Committee
National Institute of Standards and Technology (United States)
Program Committee
Institut für Technische Optik (Germany)
Program Committee
Univ. of Shanghai for Science and Technology (China)
Program Committee
Nanyang Technological Univ. (Singapore)
Program Committee
Wyant College of Optical Sciences (United States)
Program Committee
Iowa State Univ. of Science and Technology (United States)
Program Committee
Max-Planck-Institut für die Physik des Lichts (Germany)
Program Committee
Ctr. de Investigaciones en Óptica, A.C. (Mexico)
Program Committee
Ruda-Cardinal, Inc. (United States)
Program Committee
Daniel B. Millstone
4D Technology Corp. (United States)
Program Committee
Czech Technical Univ. in Prague (Czech Republic)
Program Committee
Äpre Instruments, LLC (United States)
Program Committee
Utsunomiya Univ. (Japan)
Program Committee
ICube (France)
Program Committee
4D Technology Corp. (United States)
Program Committee
Physikalisch-Technische Bundesanstalt (Germany)
Program Committee
Warsaw Univ. of Technology (Poland)
Program Committee
MetroLaser, Inc. (United States)
Program Committee
Warsaw Univ. of Technology (Poland)
Program Committee
Air Force Research Lab. (United States)
Program Committee
Purdue Univ. (United States)